Formation of uniaxially (1 1 2̄ 0) textured ZnO films on glass substrates

Takahiko Yanagitani*, Mami Matsukawa, Yoshiaki Watanabe, Takahiko Otani

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)


Making use of the RF magnetron sputtering technique, we have succeeded in fabricating ZnO films where c-axis of crystallites are unidirectionally aligned in the plane, without the mechanism of epitaxy. The alignment of c-axis in the plane was then carefully investigated by the X-ray pole figure analysis and atomic force microscope measurements. From these results, we have revealed the effect of substrate position during sputtering on the c-axis alignment in the plane. We have also pointed out the important effect of the oxygen ions in the RF plasma on the (1 1 2̄ 0) texture formation.

Original languageEnglish
Pages (from-to)424-430
Number of pages7
JournalJournal of Crystal Growth
Issue number3-4
Publication statusPublished - 2005 Apr 1
Externally publishedYes


  • A1. X-ray diffraction
  • A3. Physical vapor deposition processes
  • B1. Zinc compounds
  • B2. Piezoelectric materials

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry


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