Formation of uniaxially (1 1 2̄ 0) textured ZnO films on glass substrates

Takahiko Yanagitani; Mami Matsukawa; Yoshiaki Watanabe; Takahiko Otani

doi:10.1016/j.jcrysgro.2004.12.013

Formation of uniaxially (1 1 2̄ 0) textured ZnO films on glass substrates

Takahiko Yanagitani^*, Mami Matsukawa, Yoshiaki Watanabe, Takahiko Otani

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

33 Citations (Scopus)

Abstract

Making use of the RF magnetron sputtering technique, we have succeeded in fabricating ZnO films where c-axis of crystallites are unidirectionally aligned in the plane, without the mechanism of epitaxy. The alignment of c-axis in the plane was then carefully investigated by the X-ray pole figure analysis and atomic force microscope measurements. From these results, we have revealed the effect of substrate position during sputtering on the c-axis alignment in the plane. We have also pointed out the important effect of the oxygen ions in the RF plasma on the (1 1 2̄ 0) texture formation.

Original language	English
Pages (from-to)	424-430
Number of pages	7
Journal	Journal of Crystal Growth
Volume	276
Issue number	3-4
DOIs	https://doi.org/10.1016/j.jcrysgro.2004.12.013
Publication status	Published - 2005 Apr 1
Externally published	Yes

Keywords

A1. X-ray diffraction
A3. Physical vapor deposition processes
B1. Zinc compounds
B2. Piezoelectric materials

ASJC Scopus subject areas

Condensed Matter Physics
Inorganic Chemistry
Materials Chemistry

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10.1016/j.jcrysgro.2004.12.013

Cite this

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title = "Formation of uniaxially (1 1 {\=2} 0) textured ZnO films on glass substrates",

abstract = "Making use of the RF magnetron sputtering technique, we have succeeded in fabricating ZnO films where c-axis of crystallites are unidirectionally aligned in the plane, without the mechanism of epitaxy. The alignment of c-axis in the plane was then carefully investigated by the X-ray pole figure analysis and atomic force microscope measurements. From these results, we have revealed the effect of substrate position during sputtering on the c-axis alignment in the plane. We have also pointed out the important effect of the oxygen ions in the RF plasma on the (1 1 {\=2} 0) texture formation.",

keywords = "A1. X-ray diffraction, A3. Physical vapor deposition processes, B1. Zinc compounds, B2. Piezoelectric materials",

author = "Takahiko Yanagitani and Mami Matsukawa and Yoshiaki Watanabe and Takahiko Otani",

note = "Funding Information: The authors thank Mr. T. Mihara (AIST) for fruitful discussions on pole figure analysis. This work was partly supported by the Grants-in-Aid for Scientific Research from the Japan Society for the Promotion of Science (B) (2) and the Aid of Doshisha University's Research Promotion Fund.",

year = "2005",

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doi = "10.1016/j.jcrysgro.2004.12.013",

language = "English",

volume = "276",

pages = "424--430",

journal = "Journal of Crystal Growth",

issn = "0022-0248",

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number = "3-4",

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T1 - Formation of uniaxially (1 1 2̄ 0) textured ZnO films on glass substrates

AU - Yanagitani, Takahiko

AU - Matsukawa, Mami

AU - Watanabe, Yoshiaki

AU - Otani, Takahiko

N1 - Funding Information: The authors thank Mr. T. Mihara (AIST) for fruitful discussions on pole figure analysis. This work was partly supported by the Grants-in-Aid for Scientific Research from the Japan Society for the Promotion of Science (B) (2) and the Aid of Doshisha University's Research Promotion Fund.

PY - 2005/4/1

Y1 - 2005/4/1

N2 - Making use of the RF magnetron sputtering technique, we have succeeded in fabricating ZnO films where c-axis of crystallites are unidirectionally aligned in the plane, without the mechanism of epitaxy. The alignment of c-axis in the plane was then carefully investigated by the X-ray pole figure analysis and atomic force microscope measurements. From these results, we have revealed the effect of substrate position during sputtering on the c-axis alignment in the plane. We have also pointed out the important effect of the oxygen ions in the RF plasma on the (1 1 2̄ 0) texture formation.

AB - Making use of the RF magnetron sputtering technique, we have succeeded in fabricating ZnO films where c-axis of crystallites are unidirectionally aligned in the plane, without the mechanism of epitaxy. The alignment of c-axis in the plane was then carefully investigated by the X-ray pole figure analysis and atomic force microscope measurements. From these results, we have revealed the effect of substrate position during sputtering on the c-axis alignment in the plane. We have also pointed out the important effect of the oxygen ions in the RF plasma on the (1 1 2̄ 0) texture formation.

KW - A1. X-ray diffraction

KW - A3. Physical vapor deposition processes

KW - B1. Zinc compounds

KW - B2. Piezoelectric materials

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DO - 10.1016/j.jcrysgro.2004.12.013

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SN - 0022-0248

VL - 276

SP - 424

EP - 430

JO - Journal of Crystal Growth

JF - Journal of Crystal Growth

IS - 3-4

ER -

Formation of uniaxially (1 1 2̄ 0) textured ZnO films on glass substrates

Abstract

Keywords

ASJC Scopus subject areas

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