Generation of submilli-joule picosecond square shaped pulses for low emittance electron generation in photocathode RF-GUN

Kazuya Takasago; Akira Yada; Taisuke Miura; Masakazu Washio; Fumihiko Kannari; Kenji Torizuka; Akira Endo

doi:10.3233/jae-2002-373

Generation of submilli-joule picosecond square shaped pulses for low emittance electron generation in photocathode RF-GUN

Kazuya Takasago^*, Akira Yada, Taisuke Miura, Masakazu Washio, Fumihiko Kannari, Kenji Torizuka, Akira Endo

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Arbitrary shaping of a sub-milli joule femtosecond pulses has been demonstrated by manipulation of optical frequency phase components on the Fourier plane. The shaped pulses were pulse trains and picosecond square pulses for low emittance electron generation in a RF photocathode. Since the pulse shaping apparatus was placed between an oscillator and a pulse stretcher in order to avoid damage to the liquid crystal spatial light modulator, phase-only modulation was used for shaping to avoid damage to optical elements in a regenerative amplifier. The phase modulation was designed by simulated annealing optimization method.

Original language	English
Pages (from-to)	151-156
Number of pages	6
Journal	International Journal of Applied Electromagnetics and Mechanics
Volume	14
Issue number	1-4 SPEC.
DOIs	https://doi.org/10.3233/jae-2002-373
Publication status	Published - 2001

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

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10.3233/jae-2002-373

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abstract = "Arbitrary shaping of a sub-milli joule femtosecond pulses has been demonstrated by manipulation of optical frequency phase components on the Fourier plane. The shaped pulses were pulse trains and picosecond square pulses for low emittance electron generation in a RF photocathode. Since the pulse shaping apparatus was placed between an oscillator and a pulse stretcher in order to avoid damage to the liquid crystal spatial light modulator, phase-only modulation was used for shaping to avoid damage to optical elements in a regenerative amplifier. The phase modulation was designed by simulated annealing optimization method.",

author = "Kazuya Takasago and Akira Yada and Taisuke Miura and Masakazu Washio and Fumihiko Kannari and Kenji Torizuka and Akira Endo",

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T1 - Generation of submilli-joule picosecond square shaped pulses for low emittance electron generation in photocathode RF-GUN

AU - Takasago, Kazuya

AU - Yada, Akira

AU - Miura, Taisuke

AU - Washio, Masakazu

AU - Kannari, Fumihiko

AU - Torizuka, Kenji

AU - Endo, Akira

PY - 2001

Y1 - 2001

N2 - Arbitrary shaping of a sub-milli joule femtosecond pulses has been demonstrated by manipulation of optical frequency phase components on the Fourier plane. The shaped pulses were pulse trains and picosecond square pulses for low emittance electron generation in a RF photocathode. Since the pulse shaping apparatus was placed between an oscillator and a pulse stretcher in order to avoid damage to the liquid crystal spatial light modulator, phase-only modulation was used for shaping to avoid damage to optical elements in a regenerative amplifier. The phase modulation was designed by simulated annealing optimization method.

AB - Arbitrary shaping of a sub-milli joule femtosecond pulses has been demonstrated by manipulation of optical frequency phase components on the Fourier plane. The shaped pulses were pulse trains and picosecond square pulses for low emittance electron generation in a RF photocathode. Since the pulse shaping apparatus was placed between an oscillator and a pulse stretcher in order to avoid damage to the liquid crystal spatial light modulator, phase-only modulation was used for shaping to avoid damage to optical elements in a regenerative amplifier. The phase modulation was designed by simulated annealing optimization method.

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JO - International Journal of Applied Electromagnetics and Mechanics

JF - International Journal of Applied Electromagnetics and Mechanics

IS - 1-4 SPEC.

ER -

Generation of submilli-joule picosecond square shaped pulses for low emittance electron generation in photocathode RF-GUN

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