Helicon plasma sputtering system for fabrication of multilayer x-ray mirrors

Masaki Koike*, Mitsukuni Chiwaki, Isao H. Suzuki, Naoto Kobayashi, Naoto Kobayashi

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

21 Citations (Scopus)


The development of multilayers on plane substrates and assessment of multilayers were presented. For the fabrication of multilayer x-ray mirrors, a sputtering system using two helicon plasma cathodes was developed. The system can deposit multilayers under Ar pressure of 1.8 × 10-4 Torr. Thin layers constructed with the system were investigated employing Rutherford Backscattering and x-ray fluorescence analysis methods. W/C multilayers whose 2d spacings between 29-63 angstrom were produced on Si substrate and exhibited reflectivity for Cr K α x rays close to the value obtained from the surface roughness.

Original languageEnglish
Pages (from-to)2141-2143
Number of pages3
JournalReview of Scientific Instruments
Issue number2 pt 2
Publication statusPublished - 1995 Feb
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Instrumentation


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