High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation

Y. Zhang; T. Katoh; M. Washio; H. Yamada; S. Hamada

doi:10.1063/1.115533

High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation

Y. Zhang^*, T. Katoh, M. Washio, H. Yamada, S. Hamada

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

98 Citations (Scopus)

Abstract

Micromachining Teflon was achieved by direct exposure to synchrotron radiation and the microstructures made had the smallest surface detail down to 20 μm with structural height of more than 200 μm, that is, aspect ratio on the order of 10. The quality of micromachining Teflon by this process was found to be critically dependent on photon flux of the synchrotron radiation. Analysis of the mass distribution of gaseous species formed upon this process suggested that photochemical processes rather than pyrolytic processes may still dominate.

Original language	English
Pages (from-to)	872
Number of pages	1
Journal	Applied Physics Letters
Volume	67
DOIs	https://doi.org/10.1063/1.115533
Publication status	Published - 1995
Externally published	Yes

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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10.1063/1.115533

Cite this

@article{65e7c9dea26b482db9af7fbcbfcd6efd,

title = "High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation",

abstract = "Micromachining Teflon was achieved by direct exposure to synchrotron radiation and the microstructures made had the smallest surface detail down to 20 μm with structural height of more than 200 μm, that is, aspect ratio on the order of 10. The quality of micromachining Teflon by this process was found to be critically dependent on photon flux of the synchrotron radiation. Analysis of the mass distribution of gaseous species formed upon this process suggested that photochemical processes rather than pyrolytic processes may still dominate.",

author = "Y. Zhang and T. Katoh and M. Washio and H. Yamada and S. Hamada",

year = "1995",

doi = "10.1063/1.115533",

language = "English",

volume = "67",

pages = "872",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation

AU - Zhang, Y.

AU - Katoh, T.

AU - Washio, M.

AU - Yamada, H.

AU - Hamada, S.

PY - 1995

Y1 - 1995

N2 - Micromachining Teflon was achieved by direct exposure to synchrotron radiation and the microstructures made had the smallest surface detail down to 20 μm with structural height of more than 200 μm, that is, aspect ratio on the order of 10. The quality of micromachining Teflon by this process was found to be critically dependent on photon flux of the synchrotron radiation. Analysis of the mass distribution of gaseous species formed upon this process suggested that photochemical processes rather than pyrolytic processes may still dominate.

AB - Micromachining Teflon was achieved by direct exposure to synchrotron radiation and the microstructures made had the smallest surface detail down to 20 μm with structural height of more than 200 μm, that is, aspect ratio on the order of 10. The quality of micromachining Teflon by this process was found to be critically dependent on photon flux of the synchrotron radiation. Analysis of the mass distribution of gaseous species formed upon this process suggested that photochemical processes rather than pyrolytic processes may still dominate.

UR - http://www.scopus.com/inward/record.url?scp=0000236148&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0000236148&partnerID=8YFLogxK

U2 - 10.1063/1.115533

DO - 10.1063/1.115533

M3 - Article

AN - SCOPUS:0000236148

SN - 0003-6951

VL - 67

SP - 872

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -

High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation

Abstract

ASJC Scopus subject areas

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