High aspect ratio nano-scale CFX structures fabricated by deep-RIE

Takahiro Arakawa; Hiroyuki Kusakawa; Shuichi Shoji

High aspect ratio nano-scale CFX structures fabricated by deep-RIE

Takahiro Arakawa^*, Hiroyuki Kusakawa, Shuichi Shoji

^*Corresponding author for this work

School of Fundamental Science and Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

High aspect ratio (>500) nano-scale CF_x (fluorocarbon) "tube" and "test-tube" arrays were realized using Deep Reactive Ion Etching (RIE). Sidewall CF_x nano structures of 200 nm in thickness formed during Deep RIE passivation process were used for the purpose. The film thickness of CF_x was controlled from 200 nm to 500 nm, and the height more than 100 μm was available. As a result, the aspect ratio is larger than 500. This fluorocarbon tube and test-tube array are useful tools for chemical and biological applications.

Original language	English
Title of host publication	Proceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007
Pages	287-290
Number of pages	4
Publication status	Published - 2007 Dec 1
Event	20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007 - Kobe, Japan Duration: 2007 Jan 21 → 2007 Jan 25

Publication series

Name	Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN (Print)	1084-6999

Conference

Conference	20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007
Country/Territory	Japan
City	Kobe
Period	07/1/21 → 07/1/25

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Mechanical Engineering
Electrical and Electronic Engineering

Cite this

Arakawa, T., Kusakawa, H., & Shoji, S. (2007). High aspect ratio nano-scale CFX structures fabricated by deep-RIE. In Proceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007 (pp. 287-290). Article 4432970 (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)).

High aspect ratio nano-scale CFX structures fabricated by deep-RIE. / Arakawa, Takahiro; Kusakawa, Hiroyuki; Shoji, Shuichi.
Proceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007. 2007. p. 287-290 4432970 (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Arakawa, T, Kusakawa, H & Shoji, S 2007, High aspect ratio nano-scale CFX structures fabricated by deep-RIE. in Proceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007., 4432970, Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), pp. 287-290, 20th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2007, Kobe, Japan, 07/1/21.

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AU - Kusakawa, Hiroyuki

AU - Shoji, Shuichi

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N2 - High aspect ratio (>500) nano-scale CFx (fluorocarbon) "tube" and "test-tube" arrays were realized using Deep Reactive Ion Etching (RIE). Sidewall CFx nano structures of 200 nm in thickness formed during Deep RIE passivation process were used for the purpose. The film thickness of CFx was controlled from 200 nm to 500 nm, and the height more than 100 μm was available. As a result, the aspect ratio is larger than 500. This fluorocarbon tube and test-tube array are useful tools for chemical and biological applications.

AB - High aspect ratio (>500) nano-scale CFx (fluorocarbon) "tube" and "test-tube" arrays were realized using Deep Reactive Ion Etching (RIE). Sidewall CFx nano structures of 200 nm in thickness formed during Deep RIE passivation process were used for the purpose. The film thickness of CFx was controlled from 200 nm to 500 nm, and the height more than 100 μm was available. As a result, the aspect ratio is larger than 500. This fluorocarbon tube and test-tube array are useful tools for chemical and biological applications.

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BT - Proceedings - CIS Workshops 2007, 2007 International Conference on Computational Intelligence and Security Workshops, CISW 2007

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High aspect ratio nano-scale CFX structures fabricated by deep-RIE

Abstract

Publication series

Conference

ASJC Scopus subject areas

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