High aspect ratio nanovolume glass cell array fabricated by area-selective silicon electrochemical etching process

Takayuki Homma; Hirotaka Sato; Kentaro Mori; Tetsuya Osaka; Shuichi Shoji

High aspect ratio nanovolume glass cell array fabricated by area-selective silicon electrochemical etching process

Takayuki Homma^*, Hirotaka Sato, Kentaro Mori, Tetsuya Osaka, Shuichi Shoji

^*Corresponding author for this work

Research output: Contribution to journal › Conference article › peer-review

3 Citations (Scopus)

Abstract

Fabrication of arrays of high aspect ratio nanovolume glass (SiO ₂) cells or "test tubes" by using electrochemical process was attempted, which could be applied to various micro scale and nano scale systems. By applying a shield mask to the backside of the wafer to control the illumination condition of the light, which generates the hole, area selective anodization process was developed to form arrays of the straight micropores at the selected region of the Si surface. Then the surface of the micropores was thermally oxidized to form SiO₂ layer and bulk Si region was partially removed by alkaline etching to expose the array of freestanding, SiO₂ hollow rubes.

Original language	English
Pages (from-to)	705-708
Number of pages	4
Journal	Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Publication status	Published - 2004 Jul 19
Event	17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest - Maastricht, Netherlands Duration: 2004 Jan 25 → 2004 Jan 29

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Mechanical Engineering
Electrical and Electronic Engineering

Cite this

High aspect ratio nanovolume glass cell array fabricated by area-selective silicon electrochemical etching process. / Homma, Takayuki; Sato, Hirotaka; Mori, Kentaro et al.
In: Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), 19.07.2004, p. 705-708.

Research output: Contribution to journal › Conference article › peer-review

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abstract = "Fabrication of arrays of high aspect ratio nanovolume glass (SiO 2) cells or {"}test tubes{"} by using electrochemical process was attempted, which could be applied to various micro scale and nano scale systems. By applying a shield mask to the backside of the wafer to control the illumination condition of the light, which generates the hole, area selective anodization process was developed to form arrays of the straight micropores at the selected region of the Si surface. Then the surface of the micropores was thermally oxidized to form SiO2 layer and bulk Si region was partially removed by alkaline etching to expose the array of freestanding, SiO2 hollow rubes.",

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AU - Homma, Takayuki

AU - Sato, Hirotaka

AU - Mori, Kentaro

AU - Osaka, Tetsuya

AU - Shoji, Shuichi

PY - 2004/7/19

Y1 - 2004/7/19

N2 - Fabrication of arrays of high aspect ratio nanovolume glass (SiO 2) cells or "test tubes" by using electrochemical process was attempted, which could be applied to various micro scale and nano scale systems. By applying a shield mask to the backside of the wafer to control the illumination condition of the light, which generates the hole, area selective anodization process was developed to form arrays of the straight micropores at the selected region of the Si surface. Then the surface of the micropores was thermally oxidized to form SiO2 layer and bulk Si region was partially removed by alkaline etching to expose the array of freestanding, SiO2 hollow rubes.

AB - Fabrication of arrays of high aspect ratio nanovolume glass (SiO 2) cells or "test tubes" by using electrochemical process was attempted, which could be applied to various micro scale and nano scale systems. By applying a shield mask to the backside of the wafer to control the illumination condition of the light, which generates the hole, area selective anodization process was developed to form arrays of the straight micropores at the selected region of the Si surface. Then the surface of the micropores was thermally oxidized to form SiO2 layer and bulk Si region was partially removed by alkaline etching to expose the array of freestanding, SiO2 hollow rubes.

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AN - SCOPUS:3042822168

SN - 1084-6999

SP - 705

EP - 708

JO - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

JF - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

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Y2 - 25 January 2004 through 29 January 2004

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High aspect ratio nanovolume glass cell array fabricated by area-selective silicon electrochemical etching process

Abstract

ASJC Scopus subject areas

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