TY - JOUR
T1 - High overtone mode bulk acoustic wave resonators with polarization inverted ScAlN or SiAlN/AlN films for next-generation high frequency communication systems
AU - Suzuki, Masashi
AU - Sekimoto, Jun
AU - Fukunaga, Kei
AU - Kakio, Shoji
AU - Yanagitani, Takahiko
N1 - Publisher Copyright:
© 2025 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
PY - 2025/4/1
Y1 - 2025/4/1
N2 - For frequency filter applications in next-generation mobile communications, bulk acoustic wave (BAW) resonators are required to have high frequency operation, high keff2, high Q, and high power durability. High-overtone mode BAW resonators with multilayer polarization-inverted films can operate at higher frequencies than standard single-layer BAW resonators, while maintaining the device volume and power durability. In this paper, the frequency characteristics and BAW behavior of polarization-inverted AlN film SMRs were investigated using the finite element method and Mason’s equivalent circuit models. Polarization-inverted ScAlN film bulk acoustic wave resonators and SiAlN/AlN solidly mounted resonators (SMRs) operating in the GHz range were experimentally fabricated and evaluated. We theoretically demonstrated that the keff2 of the AlN film SMRs improves with increasing the number of polarization-inverted layers due to the improvement of the BAW energy trapping into the AlN films. We also experimentally found that the polarization-inverted SiAlN/AlN SMRs operating in high-overtone mode had higher Q and keff2 than the single-layer AlN SMR.
AB - For frequency filter applications in next-generation mobile communications, bulk acoustic wave (BAW) resonators are required to have high frequency operation, high keff2, high Q, and high power durability. High-overtone mode BAW resonators with multilayer polarization-inverted films can operate at higher frequencies than standard single-layer BAW resonators, while maintaining the device volume and power durability. In this paper, the frequency characteristics and BAW behavior of polarization-inverted AlN film SMRs were investigated using the finite element method and Mason’s equivalent circuit models. Polarization-inverted ScAlN film bulk acoustic wave resonators and SiAlN/AlN solidly mounted resonators (SMRs) operating in the GHz range were experimentally fabricated and evaluated. We theoretically demonstrated that the keff2 of the AlN film SMRs improves with increasing the number of polarization-inverted layers due to the improvement of the BAW energy trapping into the AlN films. We also experimentally found that the polarization-inverted SiAlN/AlN SMRs operating in high-overtone mode had higher Q and keff2 than the single-layer AlN SMR.
KW - AlN
KW - bulk acoustic wave resonator
KW - high overtone mode
KW - polarization inverted film
KW - ScAlN
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U2 - 10.35848/1347-4065/adc8b1
DO - 10.35848/1347-4065/adc8b1
M3 - Review article
AN - SCOPUS:105003806736
SN - 0021-4922
VL - 64
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
IS - 4
M1 - 040803
ER -