High overtone mode bulk acoustic wave resonators with polarization inverted ScAlN or SiAlN/AlN films for next-generation high frequency communication systems

Masashi Suzuki*, Jun Sekimoto, Kei Fukunaga, Shoji Kakio, Takahiko Yanagitani

*Corresponding author for this work

Research output: Contribution to journalReview articlepeer-review

Abstract

For frequency filter applications in next-generation mobile communications, bulk acoustic wave (BAW) resonators are required to have high frequency operation, high keff2, high Q, and high power durability. High-overtone mode BAW resonators with multilayer polarization-inverted films can operate at higher frequencies than standard single-layer BAW resonators, while maintaining the device volume and power durability. In this paper, the frequency characteristics and BAW behavior of polarization-inverted AlN film SMRs were investigated using the finite element method and Mason’s equivalent circuit models. Polarization-inverted ScAlN film bulk acoustic wave resonators and SiAlN/AlN solidly mounted resonators (SMRs) operating in the GHz range were experimentally fabricated and evaluated. We theoretically demonstrated that the keff2 of the AlN film SMRs improves with increasing the number of polarization-inverted layers due to the improvement of the BAW energy trapping into the AlN films. We also experimentally found that the polarization-inverted SiAlN/AlN SMRs operating in high-overtone mode had higher Q and keff2 than the single-layer AlN SMR.

Original languageEnglish
Article number040803
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume64
Issue number4
DOIs
Publication statusPublished - 2025 Apr 1

Keywords

  • AlN
  • bulk acoustic wave resonator
  • high overtone mode
  • polarization inverted film
  • ScAlN

ASJC Scopus subject areas

  • General Engineering
  • General Physics and Astronomy

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