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High-quality SiO2 film formation by highly concentrated ozone gas at below 600°C
Tetsuya Nishiguchi*, Hidehiko Nonaka, Shingo Ichimura, Yoshiki Morikawa, Mitsuru Kekura, Masaharu Miyamoto
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
48
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(Scopus)