TY - JOUR
T1 - Humidity effects on the redox reactions and ionic transport in a Cu/Ta2O5/Pt atomic switch structure
AU - Tsuruoka, Tohru
AU - Valov, Ilia
AU - Mannequin, Cedric
AU - Hasegawa, Tsuyoshi
AU - Waser, Rainer
AU - Aono, Masakazu
N1 - Publisher Copyright:
© 2016 The Japan Society of Applied Physics.
PY - 2016/6
Y1 - 2016/6
N2 - Redox reactions at the Cu/Ta2O5 interface and subsequent Cu ion transport in a Ta2O5 film have been investigated by means of cyclic voltammetry (CV) measurements. Under positive bias to the Cu electrode, Cu is preferentially oxidized to Cu2+ and then to Cu+. Subsequent negative bias causes a reduction of the oxidized Cu ions at the interface. It was found that CV curves change drastically with varied relative humidity levels from 5 to 85%. At higher humidity levels, the ion concentrations and diffusion coefficients, estimated from the CV curves, suggest increased redox reaction rates and a significant contribution of proton conduction to the ionic transport. The results indicate that the redox reactions of moisture are rate-limiting and highlight the importance of water uptake by the matrix oxide film in understanding and controlling the resistive switching behavior of oxide-based atomic switches.
AB - Redox reactions at the Cu/Ta2O5 interface and subsequent Cu ion transport in a Ta2O5 film have been investigated by means of cyclic voltammetry (CV) measurements. Under positive bias to the Cu electrode, Cu is preferentially oxidized to Cu2+ and then to Cu+. Subsequent negative bias causes a reduction of the oxidized Cu ions at the interface. It was found that CV curves change drastically with varied relative humidity levels from 5 to 85%. At higher humidity levels, the ion concentrations and diffusion coefficients, estimated from the CV curves, suggest increased redox reaction rates and a significant contribution of proton conduction to the ionic transport. The results indicate that the redox reactions of moisture are rate-limiting and highlight the importance of water uptake by the matrix oxide film in understanding and controlling the resistive switching behavior of oxide-based atomic switches.
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U2 - 10.7567/JJAP.55.06GJ09
DO - 10.7567/JJAP.55.06GJ09
M3 - Article
AN - SCOPUS:84974577916
SN - 0021-4922
VL - 55
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 6
M1 - 06GJ09
ER -