TY - JOUR
T1 - II-VI/III-V heterointerfaces
T2 - Epilayer-on-epilayer structures
AU - Qian, Q. D.
AU - Qiu, J.
AU - Glenn, J. L.
AU - O, Sungki
AU - Gunshor, R. L.
AU - Kolodziejski, L. A.
AU - Kobayashi, M.
AU - Otsuka, N.
AU - Melloch, M. R.
AU - Cooper, J. A.
AU - Haggerott, M.
AU - Heyen, T.
AU - Nurmikko, A. V.
N1 - Funding Information:
Many people have made significant contrihu-lions to the aforementioned research. The authors would like to thank C. Choi, and J.M. Gonsalves for insight provided by the TEM investigations. and Professor R.F. Pierret for his participation in the electrical characterization of the ZnSe/GaAs interface. Thanks also go to D. Lubelski. M. Vaziri. D.P. Munich. S. Durhin, and D. Mathine. Research support was provided by SDIO/IST-Naval Research Laboratory Contract N00014-86-K2017, Defense Advanced Research Projects Agencv/ Office of Naval Research University Research Initiative, the National Science Foundation-MRG Grant DMR-8520866. and the Office of Naval Research under Contract No. N00014-87-K0522 and N00014-87-K0521.
PY - 1989/2/2
Y1 - 1989/2/2
N2 - The integration of several optoelectronic device functions onto a common substrate material is an area which is currently being actively pursued. In an effort to achieve this objective, experiments are under way to examine the epitaxial growth and material properties of a variety of both II-VI and III-V compounds grown on a substrate where the II-VI/III-V heterostructure can be utilized. This paper describes some recent developments involving the molecular beam epitaxial (MBE) growth and characterization of two important II-VI/III-V heterostructures, CdTe/InSb and ZnSe/GaAs. The structures are formed taking three approaches, by using (i) surface passivation techniques, combined with transfer in air from one chamber to the other, (ii) separate growth chambers connected by an ultrahigh vacuum transfer module, and (iii) both III-V and II-VI growth is performed in the same growth chamber. Multiple quantum wells of InSb have been grown at low temperatures of 300°C, using either Sb4 or Sb2 (the Sb2 originates from an antimony cracker). Electrical characterization of metal/pseudomorphic ZnSe/p-GaAs capacitor structures illustrates accumulation, depletion and deep depletion; high frequency capacitance versus voltage data indicate interface state densities for the ZnSe/GaAs interface to be comparable to those reported for (Al,Ga)As/GaAs interfaces. The following paper represents a combined summary of two papers presented at the 5th International Conference on Molecular Beam Epitaxy.
AB - The integration of several optoelectronic device functions onto a common substrate material is an area which is currently being actively pursued. In an effort to achieve this objective, experiments are under way to examine the epitaxial growth and material properties of a variety of both II-VI and III-V compounds grown on a substrate where the II-VI/III-V heterostructure can be utilized. This paper describes some recent developments involving the molecular beam epitaxial (MBE) growth and characterization of two important II-VI/III-V heterostructures, CdTe/InSb and ZnSe/GaAs. The structures are formed taking three approaches, by using (i) surface passivation techniques, combined with transfer in air from one chamber to the other, (ii) separate growth chambers connected by an ultrahigh vacuum transfer module, and (iii) both III-V and II-VI growth is performed in the same growth chamber. Multiple quantum wells of InSb have been grown at low temperatures of 300°C, using either Sb4 or Sb2 (the Sb2 originates from an antimony cracker). Electrical characterization of metal/pseudomorphic ZnSe/p-GaAs capacitor structures illustrates accumulation, depletion and deep depletion; high frequency capacitance versus voltage data indicate interface state densities for the ZnSe/GaAs interface to be comparable to those reported for (Al,Ga)As/GaAs interfaces. The following paper represents a combined summary of two papers presented at the 5th International Conference on Molecular Beam Epitaxy.
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U2 - 10.1016/0022-0248(89)90468-5
DO - 10.1016/0022-0248(89)90468-5
M3 - Article
AN - SCOPUS:0024605728
SN - 0022-0248
VL - 95
SP - 567
EP - 571
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
IS - 1-4
ER -