In-channel 3-D micromesh structures using maskless multi-angle exposures and their microfilter application

Hironobu Sato*, Takayuki Kakinuma, Jeung Sang Go, Shuichi Shoji

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

59 Citations (Scopus)


This paper presents a fabrication method of in-channel three-dimensional micromesh structures using conventional photolithography. The micromesh was realized by exposing UV light from the backside of the SU-8 coated metal-patterned glass substrate for different angles. Number of exposures and irradiation angles decided the shape and the size of micromesh. Based on this technique, three different micromesh-inserted microchannel structures were fabricated using the same Cr pattern on the glass substrate. For hydrodynamic characterization, their flow resistances were measured. Finally, for the application of micro total analysis systems (μTAS), the microfilter was fabricated and its filtering property was demonstrated.

Original languageEnglish
Pages (from-to)87-92
Number of pages6
JournalSensors and Actuators, A: Physical
Issue number1
Publication statusPublished - 2004 Mar 1
EventMicromechanics Section of Sensors and Actuators, based on - Kyoto, Japan
Duration: 2003 Jan 192003 Jan 23


  • 3-D micromesh structure
  • Backside exposure
  • In-channel microfilter
  • SU-8

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electrical and Electronic Engineering


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