Increase of the resistivity of electroless-deposited high-Bs CoNiFeB thin films

Masataka Sobue*, Takayuki Segawa, Tokihiko Yokoshima, Tetsuya Osaka, Daiju Kaneko, Atsushi Tanaka

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

8 Citations (Scopus)


In order to increase the resistivity of electroless-deposited high-Bs CoNiFeB thin films, it was decided to investigate the effect of adding a β-alanine containing complexing agent to the plating bath. The resistivity (ρ) gradually increased as the β-alanine concentration was increased. CoNiFeB thin films with desirable soft magnetic properties, Bs = 17-17.5 kG and Hc < 3.0 Oe, were obtained under these conditions with ρ value (70-90 μΩ cm) dependant on carbon incorporation in the films. It has been suggested that carbon impurities in the films resulting from the use of the β-alanine complexing agent containing -NH2 group causes electron scattering, leading to an increase in the resistivity.

Original languageEnglish
Pages (from-to)2228-2230
Number of pages3
JournalIEEE Transactions on Magnetics
Issue number5 I
Publication statusPublished - 2002 Sept
Event2002 International Magnetics Conference (Intermag 2002) - Amsterdam, Netherlands
Duration: 2002 Apr 282002 May 2


  • Additives
  • CoNiFe
  • Electroless deposition
  • High B
  • Organic
  • Resistivity
  • Soft magnetic thin films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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