Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

Xue Dong Liu; Hiroshi Funakubo; Suguru Noda; Hiroshi Komiyama

doi:10.1002/1521-3862(200111)7:6<253::AID-CVDE253>3.0.CO;2-1

Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

Xue Dong Liu^*, Hiroshi Funakubo, Suguru Noda, Hiroshi Komiyama

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO₂/Si substrate at 400 °C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behavior of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

Original language	English
Pages (from-to)	253-259
Number of pages	7
Journal	Chemical Vapor Deposition
Volume	7
Issue number	6
DOIs	https://doi.org/10.1002/1521-3862(200111)7:6<253::AID-CVDE253>3.0.CO;2-1
Publication status	Published - 2001 Nov 1
Externally published	Yes

Keywords

Formation mechanisms
Lead
MOCVD
Modelling
Niobium
Titanium
Two-dimensional vector analysis

ASJC Scopus subject areas

Chemistry(all)
Surfaces and Interfaces
Process Chemistry and Technology

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10.1002/1521-3862(200111)7:6<253::AID-CVDE253>3.0.CO;2-1

Cite this

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title = "Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD",

abstract = "Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400 °C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behavior of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.",

keywords = "Formation mechanisms, Lead, MOCVD, Modelling, Niobium, Titanium, Two-dimensional vector analysis",

author = "Liu, {Xue Dong} and Hiroshi Funakubo and Suguru Noda and Hiroshi Komiyama",

year = "2001",

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T1 - Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

AU - Liu, Xue Dong

AU - Funakubo, Hiroshi

AU - Noda, Suguru

AU - Komiyama, Hiroshi

PY - 2001/11/1

Y1 - 2001/11/1

N2 - Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400 °C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behavior of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

AB - Pb-Ti-Nb-O ferroelectric thin films with various Nb additions are grown on a Pt/Ti/SiO2/Si substrate at 400 °C by metal-organic (MO) CVD. A high density of dome-like surface protrusions is observed by scanning electron microscopy (SEM) in all the as-prepared films. Both the shape and the size of the surface defects are found to be Nb-content-dependent. The internal microstructure of the protrusions is further characterized by cross-section transmission electron microscopy (XTEM). The origins of these surface defects are discussed, based on the substrate hillock as well as the crystallization behavior of the film forming precursors during MOCVD. The development of the observed surface defects is modeled using a two-dimensional vector analysis.

KW - Formation mechanisms

KW - Lead

KW - MOCVD

KW - Modelling

KW - Niobium

KW - Titanium

KW - Two-dimensional vector analysis

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Internal microstructure and formation mechanism of surface protrusions in Pb-Ti-Nb-O thin films prepared by MOCVD

Abstract

Keywords

ASJC Scopus subject areas

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