Irradiation effects on silica glass by ion microbeam for fabrication of optical elements

Masato Murai; Kazunari Fukagawa; Hiroyuki Nishikawa; Tomoharu Nakamura; Yoshimichi Ohki; Masakazu Oikawa; Takahiro Sato; Kazuo Arakawa

doi:10.1109/iseim.2005.193377

Irradiation effects on silica glass by ion microbeam for fabrication of optical elements

Masato Murai^*, Kazunari Fukagawa, Hiroyuki Nishikawa, Tomoharu Nakamura, Yoshimichi Ohki, Masakazu Oikawa, Takahiro Sato, Kazuo Arakawa

^*Corresponding author for this work

Kagami Memorial Research Institute for Materials Science and Technology

Research output: Contribution to conference › Paper › peer-review

Abstract

Irradiation of ion microbeam can induce a local refractive index change in silica glass. We have evaluated the changes in electronic structures of microbeam-irradiated silica glass by means of micro-photoluminescence and phase microscope measurements. Attention should be paid to the energy deposition processes by both electronic and nuclear stopping powers to control the depth distribution of refractive index changes. Also, a chemical effect induced by ion species such as protons at the projected range was also discussed.

Original language	English
Pages	210-213
Number of pages	4
DOIs	https://doi.org/10.1109/iseim.2005.193377
Publication status	Published - 2005
Event	2005 International Symposium on Electrical Insulating Materials, ISEIM 2005 - Kitakyushu, Japan Duration: 2005 Jun 5 → 2005 Jun 9

Conference

Conference	2005 International Symposium on Electrical Insulating Materials, ISEIM 2005
Country/Territory	Japan
City	Kitakyushu
Period	05/6/5 → 05/6/9

ASJC Scopus subject areas

Engineering(all)
Materials Science(all)

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10.1109/iseim.2005.193377

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Murai, M, Fukagawa, K, Nishikawa, H, Nakamura, T, Ohki, Y, Oikawa, M, Sato, T & Arakawa, K 2005, 'Irradiation effects on silica glass by ion microbeam for fabrication of optical elements', Paper presented at 2005 International Symposium on Electrical Insulating Materials, ISEIM 2005, Kitakyushu, Japan, 05/6/5 - 05/6/9 pp. 210-213. https://doi.org/10.1109/iseim.2005.193377

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author = "Masato Murai and Kazunari Fukagawa and Hiroyuki Nishikawa and Tomoharu Nakamura and Yoshimichi Ohki and Masakazu Oikawa and Takahiro Sato and Kazuo Arakawa",

year = "2005",

doi = "10.1109/iseim.2005.193377",

language = "English",

pages = "210--213",

note = "2005 International Symposium on Electrical Insulating Materials, ISEIM 2005 ; Conference date: 05-06-2005 Through 09-06-2005",

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AU - Murai, Masato

AU - Fukagawa, Kazunari

AU - Nishikawa, Hiroyuki

AU - Nakamura, Tomoharu

AU - Ohki, Yoshimichi

AU - Oikawa, Masakazu

AU - Sato, Takahiro

AU - Arakawa, Kazuo

PY - 2005

Y1 - 2005

N2 - Irradiation of ion microbeam can induce a local refractive index change in silica glass. We have evaluated the changes in electronic structures of microbeam-irradiated silica glass by means of micro-photoluminescence and phase microscope measurements. Attention should be paid to the energy deposition processes by both electronic and nuclear stopping powers to control the depth distribution of refractive index changes. Also, a chemical effect induced by ion species such as protons at the projected range was also discussed.

AB - Irradiation of ion microbeam can induce a local refractive index change in silica glass. We have evaluated the changes in electronic structures of microbeam-irradiated silica glass by means of micro-photoluminescence and phase microscope measurements. Attention should be paid to the energy deposition processes by both electronic and nuclear stopping powers to control the depth distribution of refractive index changes. Also, a chemical effect induced by ion species such as protons at the projected range was also discussed.

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T2 - 2005 International Symposium on Electrical Insulating Materials, ISEIM 2005

Y2 - 5 June 2005 through 9 June 2005

ER -

Irradiation effects on silica glass by ion microbeam for fabrication of optical elements

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