TY - JOUR
T1 - LARGE AREA EXPOSURE IN SYNCHROTRON RADIATION LITHOGRAPHY UTILIZING THE STEERING OF THE ELECTRON BEAM IN THE STORAGE RING.
AU - Tanino, Hiroshi
AU - Hoh, Koichiro
AU - Hirata, Masahiro
AU - Ichimura, Shingo
AU - Atoda, Nobufumi
AU - Tomimasu, Takio
AU - Noguchi, Tsutomu
AU - Sugiyama, Suguru
AU - Yamazaki, Tetsuo
PY - 1983
Y1 - 1983
N2 - It is demonstrated that the vertical (normal to the plane of electron orbit) width of exposed region in synchrotron radiation lithography can be expanded by a factor of more than three by steering the electron beam in the storage ring with a horizontal magnetic field, without losing intensity and homogeneity. The vertical distribution of the developed thickness in the resist and its vertical shift with the steering magnetic field are evaluated. The perturbation in the electron orbit is also estimated from the shifts of soft X-rays and visible illuminated regions.
AB - It is demonstrated that the vertical (normal to the plane of electron orbit) width of exposed region in synchrotron radiation lithography can be expanded by a factor of more than three by steering the electron beam in the storage ring with a horizontal magnetic field, without losing intensity and homogeneity. The vertical distribution of the developed thickness in the resist and its vertical shift with the steering magnetic field are evaluated. The perturbation in the electron orbit is also estimated from the shifts of soft X-rays and visible illuminated regions.
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U2 - 10.1143/jjap.22.l677
DO - 10.1143/jjap.22.l677
M3 - Article
AN - SCOPUS:17644443624
SN - 0021-4922
VL - 22
SP - l677-l679
JO - Japanese Journal of Applied Physics, Part 2: Letters
JF - Japanese Journal of Applied Physics, Part 2: Letters
IS - 11
ER -