Low-Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD

Jin Wei; Hiroshi Kawarada; Jun Ichi Suzuki; Akio Hiraki

doi:10.1143/JJAP.29.L1483

Low-Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD

Jin Wei^*, Hiroshi Kawarada, Jun Ichi Suzuki, Akio Hiraki

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

29 Citations (Scopus)

Abstract

At a low temperature of 500°C, we have formed diamond films on Al substrates at 0.1 Torr using a magneto-microwave plasma CVD system. Since diamond can be formed at the low pressure of 0.1 Torr, the important parameters for diamond formation such as the plasma density during the diamond deposition can be measured and is found to be the highest (2.1×10₁₁cm_-3) at ECR condition. Above 1×10₁₁cm_-3, using a (CH₄+CO₂)/H₂mixture, which is a suitable reaction gas for low-temperature diamond formation, high-quality diamond films have been obtained at temperatures as low as 500°C and at low pressure (0.1 Torr) on Al.

Original language	English
Pages (from-to)	L1483-L1485
Journal	Japanese journal of applied physics
Volume	29
Issue number	8
DOIs	https://doi.org/10.1143/JJAP.29.L1483
Publication status	Published - 1990 Aug
Externally published	Yes

Keywords

Cvd
Diamond film
Double probe
Ecr
Plasma density

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.1143/JJAP.29.L1483

Cite this

@article{c182d8f4a22041fb8045d831095d0b9f,

title = "Low-Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD",

abstract = "At a low temperature of 500°C, we have formed diamond films on Al substrates at 0.1 Torr using a magneto-microwave plasma CVD system. Since diamond can be formed at the low pressure of 0.1 Torr, the important parameters for diamond formation such as the plasma density during the diamond deposition can be measured and is found to be the highest (2.1×1011cm-3) at ECR condition. Above 1×1011cm-3, using a (CH4+CO2)/H2mixture, which is a suitable reaction gas for low-temperature diamond formation, high-quality diamond films have been obtained at temperatures as low as 500°C and at low pressure (0.1 Torr) on Al.",

keywords = "Cvd, Diamond film, Double probe, Ecr, Plasma density",

author = "Jin Wei and Hiroshi Kawarada and Suzuki, {Jun Ichi} and Akio Hiraki",

year = "1990",

month = aug,

doi = "10.1143/JJAP.29.L1483",

language = "English",

volume = "29",

pages = "L1483--L1485",

journal = "Japanese journal of applied physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "8",

}

TY - JOUR

T1 - Low-Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD

AU - Wei, Jin

AU - Kawarada, Hiroshi

AU - Suzuki, Jun Ichi

AU - Hiraki, Akio

PY - 1990/8

Y1 - 1990/8

N2 - At a low temperature of 500°C, we have formed diamond films on Al substrates at 0.1 Torr using a magneto-microwave plasma CVD system. Since diamond can be formed at the low pressure of 0.1 Torr, the important parameters for diamond formation such as the plasma density during the diamond deposition can be measured and is found to be the highest (2.1×1011cm-3) at ECR condition. Above 1×1011cm-3, using a (CH4+CO2)/H2mixture, which is a suitable reaction gas for low-temperature diamond formation, high-quality diamond films have been obtained at temperatures as low as 500°C and at low pressure (0.1 Torr) on Al.

AB - At a low temperature of 500°C, we have formed diamond films on Al substrates at 0.1 Torr using a magneto-microwave plasma CVD system. Since diamond can be formed at the low pressure of 0.1 Torr, the important parameters for diamond formation such as the plasma density during the diamond deposition can be measured and is found to be the highest (2.1×1011cm-3) at ECR condition. Above 1×1011cm-3, using a (CH4+CO2)/H2mixture, which is a suitable reaction gas for low-temperature diamond formation, high-quality diamond films have been obtained at temperatures as low as 500°C and at low pressure (0.1 Torr) on Al.

KW - Cvd

KW - Diamond film

KW - Double probe

KW - Ecr

KW - Plasma density

UR - http://www.scopus.com/inward/record.url?scp=0025475724&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0025475724&partnerID=8YFLogxK

U2 - 10.1143/JJAP.29.L1483

DO - 10.1143/JJAP.29.L1483

M3 - Article

AN - SCOPUS:0025475724

SN - 0021-4922

VL - 29

SP - L1483-L1485

JO - Japanese journal of applied physics

JF - Japanese journal of applied physics

IS - 8

ER -

Low-Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this