Magnetic properties of electroless-deposited NiFeB and electrodeposited NiFe alloy thin films

Madoka Takai*, Kensuke Kageyama, Sanae Takefusa, Akiyoshi Nakamura, Tetsuya Osaka

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)

Abstract

The magnetic properties and the structure of electroless-deposited NiFeB films were investigated in comparison with those of electrodeposited NiFe films. The electroless-deposited NiFeB film with 27at% Fe content had the lowest coercivity, Hc, as low as 0.5 Oe with a saturation magnetic flux density, Bs, of 1.0 T. The saturation magnetostriction, λs, and the uniaxial magnetic anisotropy, Hk, were 5.0×10-6 and 10 Oe, respectively, which were larger than those of the conventional, electrodeposited permalloy film. The permeability of as-deposited Ni70Fe27B3 film was 1000 at 1 MHz. In order to improve the permeability, the film was heated at 200 °C in a magnetic field applied in the hard-axis direction to decrease the Hk value, and the permeability became 2000 at 1 MHz. The crystal structure and grain size of NiFeB and NiFe films were investigated by XRD, THEED and TEM. Both films with low Hc had an fcc structure; the grain size of the NiFeB film was smaller than 10 nm, while that of the NiFe film was larger, approximately 20 nm. The results suggested that the electroless-deposited NiFeB film had a larger magnetic anisotropy than the electrodeposited NiFe film. Moreover, the films with Hc less than 10 Oe did not show clear difference between their TEM bright images and THEED patterns.

Original languageEnglish
Pages (from-to)1530-1535
Number of pages6
JournalIEICE Transactions on Electronics
VolumeE78-C
Issue number11
Publication statusPublished - 1995 Nov
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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