TY - JOUR
T1 - MASS- AND ELECTRON-SPECTROSCOPIC OBSERVATION OF RESIST DECOMPOSITION BY SYNCHROTRON RADIATION.
AU - Ichimura, Shingo
AU - Hirata, Masahiro
AU - Tanino, Hiroshi
AU - Atoda, Nobufumi
AU - Hoh, Koichiro
AU - Ono, Masatoshi
PY - 1983
Y1 - 1983
N2 - Analytical techniques of mass- and electron-spectroscopy were applied to the observation of lithography by synchrotron radiation (SR). During the exposure of positive resist to SR, the tendency of side-chain components easily dissociating was shown by mass spectroscopy. In-situ analysis with electron spectroscopy showed that the height of a peak appearing at low energy increased during the exposure when the power density of SR was high. This increase was closely related to the reduction in the film thickness by SR due to the dissociation of constituent molecules of the resist.
AB - Analytical techniques of mass- and electron-spectroscopy were applied to the observation of lithography by synchrotron radiation (SR). During the exposure of positive resist to SR, the tendency of side-chain components easily dissociating was shown by mass spectroscopy. In-situ analysis with electron spectroscopy showed that the height of a peak appearing at low energy increased during the exposure when the power density of SR was high. This increase was closely related to the reduction in the film thickness by SR due to the dissociation of constituent molecules of the resist.
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U2 - 10.1143/jjap.22.l406
DO - 10.1143/jjap.22.l406
M3 - Article
AN - SCOPUS:0020787295
SN - 0021-4922
VL - 22
SP - 406
EP - 408
JO - Japanese Journal of Applied Physics, Part 2: Letters
JF - Japanese Journal of Applied Physics, Part 2: Letters
IS - 7
ER -