Abstract
We report on the molecular beam epitaxial (MBE) growth of sulfur-based binary and ternary widegap II-VI alloys using elemental sulfur source. The growth temperatures used arranged from 180 to 310°C. The valved-cracker cell with three independently controllable heaters is used for the S source. The epitaxial layers were grown using thermally cracked S source at 200, 500 and 900°C, and the film quality was characterized by X-ray diffraction and photoluminescence.
Original language | English |
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Pages (from-to) | 403-406 |
Number of pages | 4 |
Journal | Materials Science Forum |
Volume | 182-184 |
DOIs | |
Publication status | Published - 1995 |
Externally published | Yes |
Event | Proceedings of the 4th International Workshop on Semimagnetic (Diluted Magnetic) Semiconductors - Linz, Austria Duration: 1994 Sept 26 → 1994 Sept 28 |
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering