Abstract
Memory design was carried out using one-transistor gain cell on SOI. This memory design is based on a one-transistor gain cell which is smaller, less complex to make and more scalable to sub-0.1μm generations than the existing dynamic random access memory (DRAM) cells, without resorting to new materials and device structure. Transient analysis of a device simulation was also discussed to verify operation of the floating body transistor cell (FBC).
Original language | English |
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Pages (from-to) | 152-153+454+151 |
Journal | Digest of Technical Papers - IEEE International Solid-State Circuits Conference |
Publication status | Published - 2002 Jan 1 |
Externally published | Yes |
Event | 2002 IEEE International Solid-State Circuits Conference - San Francisco, CA, United States Duration: 2002 Feb 3 → 2002 Feb 7 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering