Micro- and nano-scale fabrication of fluorinated polymers by direct etching using focused ion beam

Naoyuki Fukutake*, Nozomi Miyoshi, Yuya Takasawa, Tatsuya Urakawa, Tomoko Gowa, Kazumasa Okamoto, Akihiro Oshima, Seiichi Tagawa, Masakazu Washioy

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

Micro- and nano-scale fabrications of various fluorinated polymers were demonstrated by direct maskless etching using a focused ion beam (FIB). The etching rates of perfluorinated polymers, such as poly(tetrafluoroethylene) (PTFE), poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP), poly(tetrafluoroethylene-co-perfluoroalkoxyvinylether) (PFA), were about 500-1000 times higher than those of partially fluorinated polymers, such as poly(tetrafluoroethylene-co-ethylene) (ETFE) and poly(vinilydene-fluoride) (PVdF). Controlled high quality and high aspect-ratio nanostructures of spin-coated cross-linked PTFE were obtained without solid debris. The height and diameter of the fibers were about 1.5 μm and 90 nm, respectively. Their aspect ratio was about 17.

Original languageEnglish
Pages (from-to)652011-652015
Number of pages5
JournalJapanese journal of applied physics
Volume49
Issue number6 PART 1
DOIs
Publication statusPublished - 2010 Jun

ASJC Scopus subject areas

  • General Engineering
  • General Physics and Astronomy

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