Micro- and nano-scale fabrication of fluorinated polymers by direct etching using focused ion beam

Naoyuki Fukutake; Nozomi Miyoshi; Yuya Takasawa; Tatsuya Urakawa; Tomoko Gowa; Kazumasa Okamoto; Akihiro Oshima; Seiichi Tagawa; Masakazu Washioy

doi:10.1143/JJAP.49.065201

Micro- and nano-scale fabrication of fluorinated polymers by direct etching using focused ion beam

Naoyuki Fukutake^*, Nozomi Miyoshi, Yuya Takasawa, Tatsuya Urakawa, Tomoko Gowa, Kazumasa Okamoto, Akihiro Oshima, Seiichi Tagawa, Masakazu Washioy

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

Micro- and nano-scale fabrications of various fluorinated polymers were demonstrated by direct maskless etching using a focused ion beam (FIB). The etching rates of perfluorinated polymers, such as poly(tetrafluoroethylene) (PTFE), poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP), poly(tetrafluoroethylene-co-perfluoroalkoxyvinylether) (PFA), were about 500-1000 times higher than those of partially fluorinated polymers, such as poly(tetrafluoroethylene-co-ethylene) (ETFE) and poly(vinilydene-fluoride) (PVdF). Controlled high quality and high aspect-ratio nanostructures of spin-coated cross-linked PTFE were obtained without solid debris. The height and diameter of the fibers were about 1.5 μm and 90 nm, respectively. Their aspect ratio was about 17.

Original language	English
Pages (from-to)	652011-652015
Number of pages	5
Journal	Japanese journal of applied physics
Volume	49
Issue number	6 PART 1
DOIs	https://doi.org/10.1143/JJAP.49.065201
Publication status	Published - 2010 Jun

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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@article{47c59fd72acc4821b1bef593a70587c5,

title = "Micro- and nano-scale fabrication of fluorinated polymers by direct etching using focused ion beam",

abstract = "Micro- and nano-scale fabrications of various fluorinated polymers were demonstrated by direct maskless etching using a focused ion beam (FIB). The etching rates of perfluorinated polymers, such as poly(tetrafluoroethylene) (PTFE), poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP), poly(tetrafluoroethylene-co-perfluoroalkoxyvinylether) (PFA), were about 500-1000 times higher than those of partially fluorinated polymers, such as poly(tetrafluoroethylene-co-ethylene) (ETFE) and poly(vinilydene-fluoride) (PVdF). Controlled high quality and high aspect-ratio nanostructures of spin-coated cross-linked PTFE were obtained without solid debris. The height and diameter of the fibers were about 1.5 μm and 90 nm, respectively. Their aspect ratio was about 17.",

author = "Naoyuki Fukutake and Nozomi Miyoshi and Yuya Takasawa and Tatsuya Urakawa and Tomoko Gowa and Kazumasa Okamoto and Akihiro Oshima and Seiichi Tagawa and Masakazu Washioy",

year = "2010",

month = jun,

doi = "10.1143/JJAP.49.065201",

language = "English",

volume = "49",

pages = "652011--652015",

journal = "Japanese journal of applied physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "6 PART 1",

}

TY - JOUR

T1 - Micro- and nano-scale fabrication of fluorinated polymers by direct etching using focused ion beam

AU - Fukutake, Naoyuki

AU - Miyoshi, Nozomi

AU - Takasawa, Yuya

AU - Urakawa, Tatsuya

AU - Gowa, Tomoko

AU - Okamoto, Kazumasa

AU - Oshima, Akihiro

AU - Tagawa, Seiichi

AU - Washioy, Masakazu

PY - 2010/6

Y1 - 2010/6

N2 - Micro- and nano-scale fabrications of various fluorinated polymers were demonstrated by direct maskless etching using a focused ion beam (FIB). The etching rates of perfluorinated polymers, such as poly(tetrafluoroethylene) (PTFE), poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP), poly(tetrafluoroethylene-co-perfluoroalkoxyvinylether) (PFA), were about 500-1000 times higher than those of partially fluorinated polymers, such as poly(tetrafluoroethylene-co-ethylene) (ETFE) and poly(vinilydene-fluoride) (PVdF). Controlled high quality and high aspect-ratio nanostructures of spin-coated cross-linked PTFE were obtained without solid debris. The height and diameter of the fibers were about 1.5 μm and 90 nm, respectively. Their aspect ratio was about 17.

AB - Micro- and nano-scale fabrications of various fluorinated polymers were demonstrated by direct maskless etching using a focused ion beam (FIB). The etching rates of perfluorinated polymers, such as poly(tetrafluoroethylene) (PTFE), poly(tetrafluoroethylene-co-hexafluoropropylene) (FEP), poly(tetrafluoroethylene-co-perfluoroalkoxyvinylether) (PFA), were about 500-1000 times higher than those of partially fluorinated polymers, such as poly(tetrafluoroethylene-co-ethylene) (ETFE) and poly(vinilydene-fluoride) (PVdF). Controlled high quality and high aspect-ratio nanostructures of spin-coated cross-linked PTFE were obtained without solid debris. The height and diameter of the fibers were about 1.5 μm and 90 nm, respectively. Their aspect ratio was about 17.

UR - http://www.scopus.com/inward/record.url?scp=77955314731&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77955314731&partnerID=8YFLogxK

U2 - 10.1143/JJAP.49.065201

DO - 10.1143/JJAP.49.065201

M3 - Article

AN - SCOPUS:77955314731

SN - 0021-4922

VL - 49

SP - 652011

EP - 652015

JO - Japanese journal of applied physics

JF - Japanese journal of applied physics

IS - 6 PART 1

ER -

Micro- and nano-scale fabrication of fluorinated polymers by direct etching using focused ion beam

Abstract

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