Micro-/nanofabrication of cross-linked poly(L-lactic acid) using electron beam nanoimprint lithography

Satoshi Okubo*, Naotsugu Nagasawa, Akinobu Kobayashi, Tomoko Gowa Oyama, Mitsumasa Taguchi, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


Electron beam nanoimprint lithography was proposed for fabricating the micro-/nanostructures of cross-linked poly(L-lactic acid) (RX-PLLA). PLLA with triallyl isocyanurate (TAIC) solutions were dropped on the Si-molds fabricated by the conventional EB lithography technique. PLLA/ TAIC on Si-molds were imprinted and cross-linked with doses from 10 to 500 kGy at room temperature under vacuum. The micro-/nanostructures of RX-PLLA were successfully obtained with high accuracy. Hence, it was found that the imprinted structures of RX-PLLA (100 kGy irradiation) show low line edge roughness and high thermal durability at 120 °C.

Original languageEnglish
Article number027303
JournalApplied Physics Express
Issue number2
Publication statusPublished - 2012 Feb

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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