Micro-/nanofabrication of cross-linked poly(L-lactic acid) using electron beam nanoimprint lithography

Satoshi Okubo; Naotsugu Nagasawa; Akinobu Kobayashi; Tomoko Gowa Oyama; Mitsumasa Taguchi; Akihiro Oshima; Seiichi Tagawa; Masakazu Washio

doi:10.1143/APEX.5.027303

Micro-/nanofabrication of cross-linked poly(L-lactic acid) using electron beam nanoimprint lithography

Satoshi Okubo^*, Naotsugu Nagasawa, Akinobu Kobayashi, Tomoko Gowa Oyama, Mitsumasa Taguchi, Akihiro Oshima, Seiichi Tagawa, Masakazu Washio

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

4 Citations (Scopus)

Abstract

Electron beam nanoimprint lithography was proposed for fabricating the micro-/nanostructures of cross-linked poly(L-lactic acid) (RX-PLLA). PLLA with triallyl isocyanurate (TAIC) solutions were dropped on the Si-molds fabricated by the conventional EB lithography technique. PLLA/ TAIC on Si-molds were imprinted and cross-linked with doses from 10 to 500 kGy at room temperature under vacuum. The micro-/nanostructures of RX-PLLA were successfully obtained with high accuracy. Hence, it was found that the imprinted structures of RX-PLLA (100 kGy irradiation) show low line edge roughness and high thermal durability at 120 °C.

Original language	English
Article number	027303
Journal	Applied Physics Express
Volume	5
Issue number	2
DOIs	https://doi.org/10.1143/APEX.5.027303
Publication status	Published - 2012 Feb

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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title = "Micro-/nanofabrication of cross-linked poly(L-lactic acid) using electron beam nanoimprint lithography",

abstract = "Electron beam nanoimprint lithography was proposed for fabricating the micro-/nanostructures of cross-linked poly(L-lactic acid) (RX-PLLA). PLLA with triallyl isocyanurate (TAIC) solutions were dropped on the Si-molds fabricated by the conventional EB lithography technique. PLLA/ TAIC on Si-molds were imprinted and cross-linked with doses from 10 to 500 kGy at room temperature under vacuum. The micro-/nanostructures of RX-PLLA were successfully obtained with high accuracy. Hence, it was found that the imprinted structures of RX-PLLA (100 kGy irradiation) show low line edge roughness and high thermal durability at 120 °C.",

author = "Satoshi Okubo and Naotsugu Nagasawa and Akinobu Kobayashi and Oyama, {Tomoko Gowa} and Mitsumasa Taguchi and Akihiro Oshima and Seiichi Tagawa and Masakazu Washio",

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doi = "10.1143/APEX.5.027303",

language = "English",

volume = "5",

journal = "Applied Physics Express",

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publisher = "Japan Society of Applied Physics",

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T1 - Micro-/nanofabrication of cross-linked poly(L-lactic acid) using electron beam nanoimprint lithography

AU - Okubo, Satoshi

AU - Nagasawa, Naotsugu

AU - Kobayashi, Akinobu

AU - Oyama, Tomoko Gowa

AU - Taguchi, Mitsumasa

AU - Oshima, Akihiro

AU - Tagawa, Seiichi

AU - Washio, Masakazu

PY - 2012/2

Y1 - 2012/2

N2 - Electron beam nanoimprint lithography was proposed for fabricating the micro-/nanostructures of cross-linked poly(L-lactic acid) (RX-PLLA). PLLA with triallyl isocyanurate (TAIC) solutions were dropped on the Si-molds fabricated by the conventional EB lithography technique. PLLA/ TAIC on Si-molds were imprinted and cross-linked with doses from 10 to 500 kGy at room temperature under vacuum. The micro-/nanostructures of RX-PLLA were successfully obtained with high accuracy. Hence, it was found that the imprinted structures of RX-PLLA (100 kGy irradiation) show low line edge roughness and high thermal durability at 120 °C.

AB - Electron beam nanoimprint lithography was proposed for fabricating the micro-/nanostructures of cross-linked poly(L-lactic acid) (RX-PLLA). PLLA with triallyl isocyanurate (TAIC) solutions were dropped on the Si-molds fabricated by the conventional EB lithography technique. PLLA/ TAIC on Si-molds were imprinted and cross-linked with doses from 10 to 500 kGy at room temperature under vacuum. The micro-/nanostructures of RX-PLLA were successfully obtained with high accuracy. Hence, it was found that the imprinted structures of RX-PLLA (100 kGy irradiation) show low line edge roughness and high thermal durability at 120 °C.

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ER -

Micro-/nanofabrication of cross-linked poly(L-lactic acid) using electron beam nanoimprint lithography

Abstract

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