MOVPE growth of InGaAsP using TBA and TBP with extremely low V/III ratio

M. Horita*, M. Suzuki, Yuichi Matsushima

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)


MOVPE growth of InGaAsP using tertiarybutylarsine (TBA) and tertiarybutylphosphine (TBP) was successfully performed with extremely low V/III ratios. The detailed V/III ratio dependence of electrical properties of InP and InGaAs and optical properties of InGaAsP is discussed. Electrical and optical properties of the epitaxial layers grown with extremely low V/III ratios were investigated for the first time. Featureless surface morphology was obtained for InP grown with V/III ratio of as low as 3. Even with such a low V/III ratio, good electrical properties, net carrier concentrations of less than 1 × 1015 cm-3 and electron Hall mobilities of higher than 30,000 cm2/V · s at 77 K, were achieved. For both InP and InGaAs grown with low V/III ratios of 1-5, the growth rates were almost the same as those with higher V/III ratios of more than 30. Good electrical properties of InGaAs were also confirmed. InGaAsP epitaxial layers with λg = 1.18-1.67 μm were grown with V/III ratios of 1-10. It was clarified experimentally that a lower V/III ratio gave a higher incorporation efficiency of phosphorus in the growth of InGaAsP using TBA and TBP. The photoluminescence intensities and full widths at half maximum at room temperature of InGaAsP/InP double hetero-structures were as good as those grown using AsH3 and PH3.

Original languageEnglish
Pages (from-to)123-128
Number of pages6
JournalJournal of Crystal Growth
Issue number1-4
Publication statusPublished - 1992 Nov 1
Externally publishedYes

ASJC Scopus subject areas

  • Condensed Matter Physics


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