Nano- and micro-fabrication of perfluorinated polymers using quantum beam technology

Nozomi Miyoshi, Akihiro Oshima, Tatsuya Urakawa, Naoyuki Fukutake, Hiroyuki Nagai, Tomoko Gowa, Yuya Takasawa, Tomohiro Takahashi, Yukari Numata, Takanori Katoh, Etsuko Katoh, Seiichi Tagawa, Masakazu Washio*

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)


Micro- and nano-fabrication researches of various perfluorinated polymers carried out recently both by synchrotron radiation (SR) direct photo-etching and by focused ion beam (FIB) direct mask less etching are reviewed. After the irradiation, the etching depth of the fabricated samples has been evaluated by optical microscope and scanning electron microscope. SR-induced surface modifications were studied by solid-state 19F nuclear magnetic resonance (NMR) spectroscopy and differential scanning calorimeter (DSC) analysis. It was found that the etching rate of FEP at 140°C was highest and that of PTFE and PFA at 140°C was lower in the SR etching. It was found that crosslinking reactions were induced by SR irradiation at the region within about 50γm from the irradiated surface. FIB mask less etching showed very attractive features for nano-scale fabrications. The aspect ratio for crosslinked PTFE (RX-PTFE) reached 390. In addition, the nano-scale controlled structures with high aspect and quality of RX-PTFE were obtained without solid debris.

Original languageEnglish
Pages (from-to)230-235
Number of pages6
JournalRadiation Physics and Chemistry
Issue number2
Publication statusPublished - 2011 Feb


  • Aspect ratio
  • Crosslinked PTFE
  • Direct etching
  • Focused ion beam (FIB)
  • Nanostructure
  • Synchrotron radiation (SR)

ASJC Scopus subject areas

  • Radiation


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