Nano- and micro-fabrication of perfluorinated polymers using quantum beam technology

Nozomi Miyoshi; Akihiro Oshima; Tatsuya Urakawa; Naoyuki Fukutake; Hiroyuki Nagai; Tomoko Gowa; Yuya Takasawa; Tomohiro Takahashi; Yukari Numata; Takanori Katoh; Etsuko Katoh; Seiichi Tagawa; Masakazu Washio

doi:10.1016/j.radphyschem.2010.07.037

Nano- and micro-fabrication of perfluorinated polymers using quantum beam technology

Nozomi Miyoshi, Akihiro Oshima, Tatsuya Urakawa, Naoyuki Fukutake, Hiroyuki Nagai, Tomoko Gowa, Yuya Takasawa, Tomohiro Takahashi, Yukari Numata, Takanori Katoh, Etsuko Katoh, Seiichi Tagawa, Masakazu Washio^*

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

Micro- and nano-fabrication researches of various perfluorinated polymers carried out recently both by synchrotron radiation (SR) direct photo-etching and by focused ion beam (FIB) direct mask less etching are reviewed. After the irradiation, the etching depth of the fabricated samples has been evaluated by optical microscope and scanning electron microscope. SR-induced surface modifications were studied by solid-state ¹⁹F nuclear magnetic resonance (NMR) spectroscopy and differential scanning calorimeter (DSC) analysis. It was found that the etching rate of FEP at 140°C was highest and that of PTFE and PFA at 140°C was lower in the SR etching. It was found that crosslinking reactions were induced by SR irradiation at the region within about 50γm from the irradiated surface. FIB mask less etching showed very attractive features for nano-scale fabrications. The aspect ratio for crosslinked PTFE (RX-PTFE) reached 390. In addition, the nano-scale controlled structures with high aspect and quality of RX-PTFE were obtained without solid debris.

Original language	English
Pages (from-to)	230-235
Number of pages	6
Journal	Radiation Physics and Chemistry
Volume	80
Issue number	2
DOIs	https://doi.org/10.1016/j.radphyschem.2010.07.037
Publication status	Published - 2011 Feb

Keywords

Aspect ratio
Crosslinked PTFE
Direct etching
Focused ion beam (FIB)
Nanostructure
Synchrotron radiation (SR)

ASJC Scopus subject areas

Radiation

Access to Document

10.1016/j.radphyschem.2010.07.037

Cite this

@article{1295dee790684f59a40ec1807e8a8f89,

title = "Nano- and micro-fabrication of perfluorinated polymers using quantum beam technology",

abstract = "Micro- and nano-fabrication researches of various perfluorinated polymers carried out recently both by synchrotron radiation (SR) direct photo-etching and by focused ion beam (FIB) direct mask less etching are reviewed. After the irradiation, the etching depth of the fabricated samples has been evaluated by optical microscope and scanning electron microscope. SR-induced surface modifications were studied by solid-state 19F nuclear magnetic resonance (NMR) spectroscopy and differential scanning calorimeter (DSC) analysis. It was found that the etching rate of FEP at 140°C was highest and that of PTFE and PFA at 140°C was lower in the SR etching. It was found that crosslinking reactions were induced by SR irradiation at the region within about 50γm from the irradiated surface. FIB mask less etching showed very attractive features for nano-scale fabrications. The aspect ratio for crosslinked PTFE (RX-PTFE) reached 390. In addition, the nano-scale controlled structures with high aspect and quality of RX-PTFE were obtained without solid debris.",

keywords = "Aspect ratio, Crosslinked PTFE, Direct etching, Focused ion beam (FIB), Nanostructure, Synchrotron radiation (SR)",

author = "Nozomi Miyoshi and Akihiro Oshima and Tatsuya Urakawa and Naoyuki Fukutake and Hiroyuki Nagai and Tomoko Gowa and Yuya Takasawa and Tomohiro Takahashi and Yukari Numata and Takanori Katoh and Etsuko Katoh and Seiichi Tagawa and Masakazu Washio",

note = "Funding Information: The authors acknowledge Professor Y. Hama of RISE, Waseda University and Dr. Y.Aoki of SHI for valuable suggestions and helpful discussion in this study. This work was supported by High-Tech Research Center Project HRC707 and “Nanotechnology Network Project (Handai Multi-Functional Nanofoundry)” of Ministry of Education, Culture, Sports, Science, and Technology (MEXT), Japan. A part of this work (A. Oshima) was supported by a Grant-in-Aid for young Scientist (B) 19760613 and (A) 216860870 from the Japan Society for the Promotion of Science (JSPS). The authors would like to thank all the SR center staffs of SHI for the operation of the storage ring, AURORA-2S.",

year = "2011",

month = feb,

doi = "10.1016/j.radphyschem.2010.07.037",

language = "English",

volume = "80",

pages = "230--235",

journal = "Radiation Physics and Chemistry",

issn = "0969-806X",

publisher = "Elsevier Limited",

number = "2",

}

TY - JOUR

T1 - Nano- and micro-fabrication of perfluorinated polymers using quantum beam technology

AU - Miyoshi, Nozomi

AU - Oshima, Akihiro

AU - Urakawa, Tatsuya

AU - Fukutake, Naoyuki

AU - Nagai, Hiroyuki

AU - Gowa, Tomoko

AU - Takasawa, Yuya

AU - Takahashi, Tomohiro

AU - Numata, Yukari

AU - Katoh, Takanori

AU - Katoh, Etsuko

AU - Tagawa, Seiichi

AU - Washio, Masakazu

N1 - Funding Information: The authors acknowledge Professor Y. Hama of RISE, Waseda University and Dr. Y.Aoki of SHI for valuable suggestions and helpful discussion in this study. This work was supported by High-Tech Research Center Project HRC707 and “Nanotechnology Network Project (Handai Multi-Functional Nanofoundry)” of Ministry of Education, Culture, Sports, Science, and Technology (MEXT), Japan. A part of this work (A. Oshima) was supported by a Grant-in-Aid for young Scientist (B) 19760613 and (A) 216860870 from the Japan Society for the Promotion of Science (JSPS). The authors would like to thank all the SR center staffs of SHI for the operation of the storage ring, AURORA-2S.

PY - 2011/2

Y1 - 2011/2

N2 - Micro- and nano-fabrication researches of various perfluorinated polymers carried out recently both by synchrotron radiation (SR) direct photo-etching and by focused ion beam (FIB) direct mask less etching are reviewed. After the irradiation, the etching depth of the fabricated samples has been evaluated by optical microscope and scanning electron microscope. SR-induced surface modifications were studied by solid-state 19F nuclear magnetic resonance (NMR) spectroscopy and differential scanning calorimeter (DSC) analysis. It was found that the etching rate of FEP at 140°C was highest and that of PTFE and PFA at 140°C was lower in the SR etching. It was found that crosslinking reactions were induced by SR irradiation at the region within about 50γm from the irradiated surface. FIB mask less etching showed very attractive features for nano-scale fabrications. The aspect ratio for crosslinked PTFE (RX-PTFE) reached 390. In addition, the nano-scale controlled structures with high aspect and quality of RX-PTFE were obtained without solid debris.

AB - Micro- and nano-fabrication researches of various perfluorinated polymers carried out recently both by synchrotron radiation (SR) direct photo-etching and by focused ion beam (FIB) direct mask less etching are reviewed. After the irradiation, the etching depth of the fabricated samples has been evaluated by optical microscope and scanning electron microscope. SR-induced surface modifications were studied by solid-state 19F nuclear magnetic resonance (NMR) spectroscopy and differential scanning calorimeter (DSC) analysis. It was found that the etching rate of FEP at 140°C was highest and that of PTFE and PFA at 140°C was lower in the SR etching. It was found that crosslinking reactions were induced by SR irradiation at the region within about 50γm from the irradiated surface. FIB mask less etching showed very attractive features for nano-scale fabrications. The aspect ratio for crosslinked PTFE (RX-PTFE) reached 390. In addition, the nano-scale controlled structures with high aspect and quality of RX-PTFE were obtained without solid debris.

KW - Aspect ratio

KW - Crosslinked PTFE

KW - Direct etching

KW - Focused ion beam (FIB)

KW - Nanostructure

KW - Synchrotron radiation (SR)

UR - http://www.scopus.com/inward/record.url?scp=78649326705&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78649326705&partnerID=8YFLogxK

U2 - 10.1016/j.radphyschem.2010.07.037

DO - 10.1016/j.radphyschem.2010.07.037

M3 - Article

AN - SCOPUS:78649326705

SN - 0969-806X

VL - 80

SP - 230

EP - 235

JO - Radiation Physics and Chemistry

JF - Radiation Physics and Chemistry

IS - 2

ER -

Nano- and micro-fabrication of perfluorinated polymers using quantum beam technology

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this