TY - GEN
T1 - Nano-scale evaluation of electrical tree initiation in silica/epoxy nano-composite thin film
AU - Onishi, Takuya
AU - Hashimoto, Shuichiro
AU - Tomita, Motohiro
AU - Watanabe, Takanobu
AU - Mura, Kotaro
AU - Tsuda, Toshihiro
AU - Yoshimitsu, Tetsuo
PY - 2017/10/27
Y1 - 2017/10/27
N2 - Many researchers have attempted use of nanocomposite (NC) materials for insulation systems at various places. A number of studies on the propagation of electrical trees have been reported, but it has not yet been clarified how the electrical tree occurs inside the NC material. In order to evaluate the origin of an electrical tree, it is important to clarify the breakdown mechanism at nano-scale. In this paper, silica/epoxy-resin NC was spin-coated on a silicon substrate and characterized by thin film analyses. The scanning electron microscope (SEM) indicates uniform dispersion of silica fillers in the NC film. The time-To-breakdown of the NC film, which is measured using micro-electrical probe system, is improved as the silica density increases. Furthermore, we succeeded in the scanning tunneling microscope (STM) observation of the NC film. Leakage sites appeared in the STM images, which were induced by the electric stress application with the STM tip. These approaches will invoke a deep understanding of the role of nano-fillers in the insulation resistance and the breakdown mechanism of NC materials.
AB - Many researchers have attempted use of nanocomposite (NC) materials for insulation systems at various places. A number of studies on the propagation of electrical trees have been reported, but it has not yet been clarified how the electrical tree occurs inside the NC material. In order to evaluate the origin of an electrical tree, it is important to clarify the breakdown mechanism at nano-scale. In this paper, silica/epoxy-resin NC was spin-coated on a silicon substrate and characterized by thin film analyses. The scanning electron microscope (SEM) indicates uniform dispersion of silica fillers in the NC film. The time-To-breakdown of the NC film, which is measured using micro-electrical probe system, is improved as the silica density increases. Furthermore, we succeeded in the scanning tunneling microscope (STM) observation of the NC film. Leakage sites appeared in the STM images, which were induced by the electric stress application with the STM tip. These approaches will invoke a deep understanding of the role of nano-fillers in the insulation resistance and the breakdown mechanism of NC materials.
KW - Dielectric breakdown
KW - Nano-composite
KW - Scanning electron microscope (SEM)
KW - Scanning tunneling microscope (STM)
KW - Silica
KW - Weibull plot
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UR - http://www.scopus.com/inward/citedby.url?scp=85041859929&partnerID=8YFLogxK
U2 - 10.23919/iseim.2017.8088759
DO - 10.23919/iseim.2017.8088759
M3 - Conference contribution
AN - SCOPUS:85041859929
T3 - Proceedings of the International Symposium on Electrical Insulating Materials
SP - 359
EP - 362
BT - Proceedings of 2017 International Symposium on Electrical Insulating Materials, ISEIM 2017
PB - Institute of Electrical Engineers of Japan
T2 - 2017 International Symposium on Electrical Insulating Materials, ISEIM 2017
Y2 - 11 September 2017 through 15 September 2017
ER -