Nano-structure Ge formed in thin film SiO2 using ion implantation

J. R. Phillips*, Olof C. Hellman, Naoto Kobayashi, Yunosuke Makita, Hajime Shibata, A. Yamada, P. Fons, Yushin Tsai, Shigeru Niki, Masataka Hasegawa, Tsutomu Iida

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

6 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds