Nanovoid formation through the annealing of amorphous Al2O 3 and WO3 films

R. Nakamura*, T. Shudo, A. Hirata, M. Ishimaru, H. Nakajima

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)


A high density of nanovoids between 2 and 13 nm in size was produced during the crystallization process when amorphous Al2O3 and WO3, which are 20-30% lower in density than their crystalline phases, were annealed. By contrast, no formation or growth of nanovoids was observed during the crystallization of amorphous TiO2, which has a density 2% lower than its crystalline phase. These results suggest that large differences in density between amorphous and crystalline oxides can be utilized to produce nanoporous structures.

Original languageEnglish
Pages (from-to)197-200
Number of pages4
JournalScripta Materialia
Issue number2
Publication statusPublished - 2011 Jan
Externally publishedYes


  • Amorphous
  • Crystallization
  • Nanoporous
  • Oxides
  • TEM

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering
  • Metals and Alloys


Dive into the research topics of 'Nanovoid formation through the annealing of amorphous Al2O 3 and WO3 films'. Together they form a unique fingerprint.

Cite this