New soft magnetic conife plated films with high Bs = 2.0-2.1 T

Tetsuya Osaka*, Madoka Takai, Katsuyoshi Hayashi, Yoshimichi Sogawa

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

73 Citations (Scopus)

Abstract

A CoNiFe film with saturation magnetic flux density (Bs) greater than 2.0 tesla (T) has been prepared for the first time as a soft magnetic film; the coereivity (Hc) of the film is less than 160 A/m (2.0 Oe). This success was achieved by formulating a new plating bath and operating conditions to form fine grains. The film has a low Hc of less than 160 A/m, a low saturation magnetostriction (λs) of approximately 10-6, and a high Bs of 2.0-2.1 T. The present invention is expected to contribute to accelerating the development of not only the technology of high-density magnetic recording but also the field of magnetic materials in general.

Original languageEnglish
Pages (from-to)1432-1434
Number of pages3
JournalIEEE Transactions on Magnetics
Volume34
Issue number4 PART 1
DOIs
Publication statusPublished - 1998

Keywords

  • Electroplating
  • High b soft magnetic film

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'New soft magnetic conife plated films with high Bs = 2.0-2.1 T'. Together they form a unique fingerprint.

Cite this