Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid - Code: BP10

J. Chiba; Y. Sugahara; K. Kuroda

doi:10.1007/BF00486231

Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid - Code: BP10

J. Chiba^*, Y. Sugahara, K. Kuroda

^*Corresponding author for this work

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and ²⁹Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me₂SiO(Me₂SiO)_nSiMe₂(OEt); n=0-4, Et = C₂H₅, Me = CH₃) and cyclic tetramer ((Me₂SiO)₄) were identified. The reaction mechanism for polysiloxane formation is discussed.

Original language	English
Pages (from-to)	153-156
Number of pages	4
Journal	Journal of Sol-Gel Science and Technology
Volume	2
Issue number	1-3
DOIs	https://doi.org/10.1007/BF00486231
Publication status	Published - 1994 Jan 1

Keywords

dimethyldiethoxysilane
non-aqueous system
oxalic acids
polydimethylsiloxane
reaction mechanism

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Ceramics and Composites
Chemistry(all)
Biomaterials
Condensed Matter Physics
Materials Chemistry

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10.1007/BF00486231

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title = "Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid - Code: BP10",

abstract = "Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and 29Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me2SiO(Me2SiO)nSiMe2(OEt); n=0-4, Et = C2H5, Me = CH3) and cyclic tetramer ((Me2SiO)4) were identified. The reaction mechanism for polysiloxane formation is discussed.",

keywords = "dimethyldiethoxysilane, non-aqueous system, oxalic acids, polydimethylsiloxane, reaction mechanism",

author = "J. Chiba and Y. Sugahara and K. Kuroda",

year = "1994",

month = jan,

day = "1",

doi = "10.1007/BF00486231",

language = "English",

volume = "2",

pages = "153--156",

journal = "Journal of Sol-Gel Science and Technology",

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TY - JOUR

T1 - Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid - Code

T2 - BP10

AU - Chiba, J.

AU - Sugahara, Y.

AU - Kuroda, K.

PY - 1994/1/1

Y1 - 1994/1/1

N2 - Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and 29Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me2SiO(Me2SiO)nSiMe2(OEt); n=0-4, Et = C2H5, Me = CH3) and cyclic tetramer ((Me2SiO)4) were identified. The reaction mechanism for polysiloxane formation is discussed.

AB - Polysiloxane formation in dimethyldiethoxysilane (DMDES)-ethyl alcohol (EtOH(D))-oxalic acid (OA) (DMDES:EtOH(D):OA=1:2:0.5) and DMDES-dimethylsulfoxide (DMSO)-OA (DMDES:DMSO:OA=1:2:0.5) systems was investigated by gas chromatography-mass spectrometry and 29Si-nuclear magnetic resonance. While the DMDES-EtOH(D)-OA system was homogeneous, the DMDES-DMSO-OA system consisted of two immiscible phases. In both systems, ethoxy-terminated linear oligomers ((EtO)Me2SiO(Me2SiO)nSiMe2(OEt); n=0-4, Et = C2H5, Me = CH3) and cyclic tetramer ((Me2SiO)4) were identified. The reaction mechanism for polysiloxane formation is discussed.

KW - dimethyldiethoxysilane

KW - non-aqueous system

KW - oxalic acids

KW - polydimethylsiloxane

KW - reaction mechanism

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JO - Journal of Sol-Gel Science and Technology

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ER -

Novel polysiloxane formation process from dimethyldiethoxysilane in the presence of oxalic acid - Code: BP10

Abstract

Keywords

ASJC Scopus subject areas

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