Optimal lithium targets for laser-plasma lithography

A. A. Andreev; T. Ueda; J. Limpouch

doi:10.1117/12.436706

Optimal lithium targets for laser-plasma lithography

A. A. Andreev^*, T. Ueda, J. Limpouch

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

11 Citations (Scopus)

Abstract

Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

Original language	English
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Editors	E.A. Dobisz
Pages	789-796
Number of pages	8
Volume	4343
DOIs	https://doi.org/10.1117/12.436706
Publication status	Published - 2001
Externally published	Yes
Event	Emerging Lithographic Technologies V - Santa Clara, CA, United States Duration: 2001 Feb 27 → 2001 Mar 1

Other

Other	Emerging Lithographic Technologies V
Country/Territory	United States
City	Santa Clara, CA
Period	01/2/27 → 01/3/1

Keywords

Debris reduction
Laser-produced plasmas
Soft x-ray source

ASJC Scopus subject areas

Electrical and Electronic Engineering
Condensed Matter Physics

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10.1117/12.436706

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title = "Optimal lithium targets for laser-plasma lithography",

abstract = "Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.",

keywords = "Debris reduction, Laser-produced plasmas, Soft x-ray source",

author = "Andreev, {A. A.} and T. Ueda and J. Limpouch",

year = "2001",

doi = "10.1117/12.436706",

language = "English",

volume = "4343",

pages = "789--796",

editor = "E.A. Dobisz",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

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T1 - Optimal lithium targets for laser-plasma lithography

AU - Andreev, A. A.

AU - Ueda, T.

AU - Limpouch, J.

PY - 2001

Y1 - 2001

N2 - Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

AB - Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

KW - Debris reduction

KW - Laser-produced plasmas

KW - Soft x-ray source

UR - http://www.scopus.com/inward/record.url?scp=0034762438&partnerID=8YFLogxK

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DO - 10.1117/12.436706

M3 - Conference contribution

AN - SCOPUS:0034762438

VL - 4343

SP - 789

EP - 796

BT - Proceedings of SPIE - The International Society for Optical Engineering

A2 - Dobisz, E.A.

T2 - Emerging Lithographic Technologies V

Y2 - 27 February 2001 through 1 March 2001

ER -

Optimal lithium targets for laser-plasma lithography

Abstract

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Keywords

ASJC Scopus subject areas

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