Optimal lithium targets for laser-plasma lithography

A. A. Andreev*, T. Ueda, J. Limpouch

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contribution

11 Citations (Scopus)


Lithium containing droplet and cluster targets irradiated by laser pulses were proposed as prospective source for soft x-ray lithography. Laser with repetition rate of several MHz and pulse duration of 10 ps was utilized to produce required radiation x-ray lithography when an optimum target was used. Analytical model and simulations showed that of lasers with energy of several mJ was required for the purpose. The use of laser pre-pulses to enhance laser conversion into emission at desired wavelengths was also proposed.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsE.A. Dobisz
Number of pages8
Publication statusPublished - 2001
Externally publishedYes
EventEmerging Lithographic Technologies V - Santa Clara, CA, United States
Duration: 2001 Feb 272001 Mar 1


OtherEmerging Lithographic Technologies V
Country/TerritoryUnited States
CitySanta Clara, CA


  • Debris reduction
  • Laser-produced plasmas
  • Soft x-ray source

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics


Dive into the research topics of 'Optimal lithium targets for laser-plasma lithography'. Together they form a unique fingerprint.

Cite this