Particle element and size simultaneous measurement using LIBS

Muneaki Wakamatsu; Satoshi Ikezawa; Toshitsugu Ueda

doi:10.1541/ieejsmas.127.397

Particle element and size simultaneous measurement using LIBS

Muneaki Wakamatsu^*, Satoshi Ikezawa, Toshitsugu Ueda

^*Corresponding author for this work

Waseda Research Institute for Science and Engineering

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

We have developed high-sensitivity in-situ measurement technology based on photons with visible to ultraviolet wavelength bands. This measurement technology builds on plasmatizing particles technology and a high-sensitivity measurement technology for measuring photons from the plasma. Thus, we have established a technology for measuring particle sizes and the constituent element content of particles with 10% accuracy.

Original language	English
Journal	IEEJ Transactions on Sensors and Micromachines
Volume	127
Issue number	9
DOIs	https://doi.org/10.1541/ieejsmas.127.397
Publication status	Published - 2007

Keywords

Laser break down
LIBS
Particle measurement technology
Time measurement

ASJC Scopus subject areas

Electrical and Electronic Engineering
Mechanical Engineering

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10.1541/ieejsmas.127.397

Cite this

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title = "Particle element and size simultaneous measurement using LIBS",

abstract = "We have developed high-sensitivity in-situ measurement technology based on photons with visible to ultraviolet wavelength bands. This measurement technology builds on plasmatizing particles technology and a high-sensitivity measurement technology for measuring photons from the plasma. Thus, we have established a technology for measuring particle sizes and the constituent element content of particles with 10% accuracy.",

keywords = "Laser break down, LIBS, Particle measurement technology, Time measurement",

author = "Muneaki Wakamatsu and Satoshi Ikezawa and Toshitsugu Ueda",

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AU - Wakamatsu, Muneaki

AU - Ikezawa, Satoshi

AU - Ueda, Toshitsugu

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Y1 - 2007

N2 - We have developed high-sensitivity in-situ measurement technology based on photons with visible to ultraviolet wavelength bands. This measurement technology builds on plasmatizing particles technology and a high-sensitivity measurement technology for measuring photons from the plasma. Thus, we have established a technology for measuring particle sizes and the constituent element content of particles with 10% accuracy.

AB - We have developed high-sensitivity in-situ measurement technology based on photons with visible to ultraviolet wavelength bands. This measurement technology builds on plasmatizing particles technology and a high-sensitivity measurement technology for measuring photons from the plasma. Thus, we have established a technology for measuring particle sizes and the constituent element content of particles with 10% accuracy.

KW - Laser break down

KW - LIBS

KW - Particle measurement technology

KW - Time measurement

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JO - IEEJ Transactions on Sensors and Micromachines

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Particle element and size simultaneous measurement using LIBS

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

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