Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Guo Jun Zhang; Takashi Tanii; Takashi Funatsu; Iwao Ohdomari

doi:10.1039/b315278b

Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Guo Jun Zhang^*, Takashi Tanii, Takashi Funatsu, Iwao Ohdomari

^*Corresponding author for this work

School of Fundamental Science and Engineering

Research output: Contribution to journal › Article › peer-review

45 Citations (Scopus)

Abstract

Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.

Original language	English
Pages (from-to)	786-787
Number of pages	2
Journal	Chemical Communications
Volume	4
Issue number	7
DOIs	https://doi.org/10.1039/b315278b
Publication status	Published - 2004 Jan 1

ASJC Scopus subject areas

Catalysis
Electronic, Optical and Magnetic Materials
Ceramics and Composites
Chemistry(all)
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1039/b315278b

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title = "Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer",

abstract = "Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.",

author = "Zhang, {Guo Jun} and Takashi Tanii and Takashi Funatsu and Iwao Ohdomari",

year = "2004",

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doi = "10.1039/b315278b",

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AU - Ohdomari, Iwao

PY - 2004/1/1

Y1 - 2004/1/1

N2 - Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.

AB - Nanoscale patterns of modified oligonucleotides are produced on octadecyltrimethoxysilane self-assembled monolayers at a silicon surface by electron beam lithography. DNA structures with feature sizes of the order of 250 nm were detected by epi-fluorescence microscopy.

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Patterning of DNA nanostructures on silicon surface by electron beam lithography of self-assembled monolayer

Abstract

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