Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light

Naoto Shirahata; Kotaro Oda; Shuuichi Asakura; Akio Fuwa; Yoshiyuki Yokogawa; Tetsuya Kameyama; Atsushi Hozumi

doi:10.1116/1.1692318

Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light

Naoto Shirahata^*, Kotaro Oda, Shuuichi Asakura, Akio Fuwa, Yoshiyuki Yokogawa, Tetsuya Kameyama, Atsushi Hozumi

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

The vacuum ultraviolet (VUV) light induced decomposition in alkyl monolayers was investigated. The alkylsilane monolayer was formed on the silicon substrate from otadecyltrimethoxysilane monolayer (OTSM). The photodecomposition of the alkyl monolayer was investigated under VUV irradiation conducted at 10 and 10⁵ Pa. The photodecomposition rate at 10 ⁵ Pa was found to be smaller than that at 10 Pa. An increase in the carboxyl coverage on the surface of silicon was observed with increasing VUV irradiation time ranging from 0 to 60 s at 10 Pa, which decreased after 60 s.

Original language	English
Pages (from-to)	1615-1619
Number of pages	5
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	22
Issue number	4
DOIs	https://doi.org/10.1116/1.1692318
Publication status	Published - 2004 Jul

ASJC Scopus subject areas

Surfaces, Coatings and Films
Surfaces and Interfaces
Physics and Astronomy (miscellaneous)

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@article{aebb923d6873446aa0ad846cb1eb49c5,

title = "Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light",

abstract = "The vacuum ultraviolet (VUV) light induced decomposition in alkyl monolayers was investigated. The alkylsilane monolayer was formed on the silicon substrate from otadecyltrimethoxysilane monolayer (OTSM). The photodecomposition of the alkyl monolayer was investigated under VUV irradiation conducted at 10 and 105 Pa. The photodecomposition rate at 10 5 Pa was found to be smaller than that at 10 Pa. An increase in the carboxyl coverage on the surface of silicon was observed with increasing VUV irradiation time ranging from 0 to 60 s at 10 Pa, which decreased after 60 s.",

author = "Naoto Shirahata and Kotaro Oda and Shuuichi Asakura and Akio Fuwa and Yoshiyuki Yokogawa and Tetsuya Kameyama and Atsushi Hozumi",

year = "2004",

month = jul,

doi = "10.1116/1.1692318",

language = "English",

volume = "22",

pages = "1615--1619",

journal = "Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "4",

}

TY - JOUR

T1 - Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light

AU - Shirahata, Naoto

AU - Oda, Kotaro

AU - Asakura, Shuuichi

AU - Fuwa, Akio

AU - Yokogawa, Yoshiyuki

AU - Kameyama, Tetsuya

AU - Hozumi, Atsushi

PY - 2004/7

Y1 - 2004/7

N2 - The vacuum ultraviolet (VUV) light induced decomposition in alkyl monolayers was investigated. The alkylsilane monolayer was formed on the silicon substrate from otadecyltrimethoxysilane monolayer (OTSM). The photodecomposition of the alkyl monolayer was investigated under VUV irradiation conducted at 10 and 105 Pa. The photodecomposition rate at 10 5 Pa was found to be smaller than that at 10 Pa. An increase in the carboxyl coverage on the surface of silicon was observed with increasing VUV irradiation time ranging from 0 to 60 s at 10 Pa, which decreased after 60 s.

AB - The vacuum ultraviolet (VUV) light induced decomposition in alkyl monolayers was investigated. The alkylsilane monolayer was formed on the silicon substrate from otadecyltrimethoxysilane monolayer (OTSM). The photodecomposition of the alkyl monolayer was investigated under VUV irradiation conducted at 10 and 105 Pa. The photodecomposition rate at 10 5 Pa was found to be smaller than that at 10 Pa. An increase in the carboxyl coverage on the surface of silicon was observed with increasing VUV irradiation time ranging from 0 to 60 s at 10 Pa, which decreased after 60 s.

UR - http://www.scopus.com/inward/record.url?scp=4344616481&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=4344616481&partnerID=8YFLogxK

U2 - 10.1116/1.1692318

DO - 10.1116/1.1692318

M3 - Article

AN - SCOPUS:4344616481

SN - 0734-2101

VL - 22

SP - 1615

EP - 1619

JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

IS - 4

ER -

Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light

Abstract

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