Photoinduced decomposition of alkyl monolayers using 172 nm vacuum ultraviolet light

Naoto Shirahata*, Kotaro Oda, Shuuichi Asakura, Akio Fuwa, Yoshiyuki Yokogawa, Tetsuya Kameyama, Atsushi Hozumi

*Corresponding author for this work

    Research output: Contribution to journalArticlepeer-review

    5 Citations (Scopus)


    The vacuum ultraviolet (VUV) light induced decomposition in alkyl monolayers was investigated. The alkylsilane monolayer was formed on the silicon substrate from otadecyltrimethoxysilane monolayer (OTSM). The photodecomposition of the alkyl monolayer was investigated under VUV irradiation conducted at 10 and 105 Pa. The photodecomposition rate at 10 5 Pa was found to be smaller than that at 10 Pa. An increase in the carboxyl coverage on the surface of silicon was observed with increasing VUV irradiation time ranging from 0 to 60 s at 10 Pa, which decreased after 60 s.

    Original languageEnglish
    Pages (from-to)1615-1619
    Number of pages5
    JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
    Issue number4
    Publication statusPublished - 2004 Jul

    ASJC Scopus subject areas

    • Surfaces, Coatings and Films
    • Surfaces and Interfaces
    • Physics and Astronomy (miscellaneous)


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