Physical and chemical analytical instruments for failure analyses in G-bit devices

Yasuhiro Mitsui*, Fumiko Yano, Yoshitaka Nakamura, Koji Kimoto, Tsuyoshi Hasegawa, Shigeharu Kimura, Kyoichiro Asayama

*Corresponding author for this work

Research output: Contribution to journalConference articlepeer-review

15 Citations (Scopus)


The current status and future trend of analytical instruments are discussed. Analytical instruments for failure analyses in sub-1/4 micron dimensions or less, require high spatial resolution and sensitivity at atomic levels. Using new analytical instruments, such as the Nano-prober for electrical characteristics inspection in actual circuits, TEM-EELS for chemical bond analysis of nanometer area and GDS for precise composition analysis, it was found that a SiO2 or TiOx film formed by water from titanic acid (TiOxH2O) produced with titan, water and chlorine, was a cause of high resistivity for a contact (CVD-W/CVD-TiN/Ti/Si) in sub-1/4 micron devices.

Original languageEnglish
Pages (from-to)329-332
Number of pages4
JournalTechnical Digest - International Electron Devices Meeting
Publication statusPublished - 1998
Externally publishedYes
EventProceedings of the 1998 IEEE International Electron Devices Meeting - San Francisco, CA, USA
Duration: 1998 Dec 61998 Dec 9

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry


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