Abstract
A device has been fabricated by loading an a-Si:H film on a polymer thin-film optical waveguide via a low index buffer layer. As an application to an optical functional device, this structure has been investigated as to its characteristics as a TE-TM mode waveguide polarizer. The loss characteristics of each mode are studied by varying the thickness of the a-Si:H film for a slab waveguide and for a practically important three-dimensional waveguide (width of 100 μm, 50 μm, 10 μm and 5 μm). The characteristics of the structures as a TE-TM mode waveguide polarizer are investigated.
Original language | English |
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Pages (from-to) | 39-45 |
Number of pages | 7 |
Journal | Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi) |
Volume | 71 |
Issue number | 12 |
Publication status | Published - 1988 Dec |
ASJC Scopus subject areas
- Electrical and Electronic Engineering