Polysiloxane formation from a tetraethoxysilane-ethyl alcohol-oxalic acid system

Yoshiyuki Sugahara*, Shuji Sato, Kazuyuki Kuroda, Chuzo Kato

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)


Polysiloxane formation in a tetraethoxysilane (TEOS)-ethyl alcohol (EtOD(H))-oxalic acid (OA) system without the addition of water was investigated by 29Si nuclear magnetic resonance spectroscopy (29Si-NMR). In the system with TEOS:EtOD(H):OA = 1:6:1, considerable amounts of linear oligosiloxanes possessing only ethoxy groups formed, and (EtO)3SiOSi(OEt)3, (EtO)3SiOSi(OEt)2OSi(OEt)3, and (EtO)3Si(OSi(OEt)2)2OSi(OEt)3 were identified. When the amount of OA increased to TEOS:EtOD(H):OA = 1:6:2, the polymerization rate increased considerably. The observed Si-species scarcely possessed hydroxyls, suggesting unique siloxane formation in this system.

Original languageEnglish
Pages (from-to)24-29
Number of pages6
JournalJournal of Non-Crystalline Solids
Issue numberC
Publication statusPublished - 1992

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Condensed Matter Physics
  • Materials Chemistry


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