Preparation of a mesoporous silica film with a strictly aligned porous structure through a sol-gel process

Hirokatsu Miyata*, Yasuhiro Kawashima, Miki Itoh, Masatoshi Watanabe

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

62 Citations (Scopus)

Abstract

A novel strategy for the preparation of a mesoporous silica film, in which the in-plane alignment of the honeycomb packed mesochannels is strictly controlled, is developed. The highly aligned porous structure is achieved by using a substrate with a rubbing-treated polyimide coating in the evaporation induced self-assembly process. It is shown that the controlled porous structure is formed over the entire thickness of the film and that the alignment distribution is much narrower than that in the films prepared by the conventional process based on a heterogeneous nucleation and growth mechanism. In the present process, the aligned porous structure would be formed through a directional lamellar-to-hexagonal phase transition from the substrate surface toward the air/film interface. The new formation mechanism as well as the lower process temperature enables the observed strict alignment control of the mesochannels.

Original languageEnglish
Pages (from-to)5323-5327
Number of pages5
JournalChemistry of Materials
Volume17
Issue number21
DOIs
Publication statusPublished - 2005 Oct 18
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)
  • Materials Chemistry

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