Preparation of CoB Soft Magnetic Thin Films by Eleetroless Plating

T. Osaka; T. Honma; N. Masubuchi; K. Saito; M. Yoshino; Y. Yamazaki; T. Namikawa

doi:10.1109/TJMJ.1991.4565111

Preparation of CoB Soft Magnetic Thin Films by Eleetroless Plating

T. Osaka, T. Honma, N. Masubuchi, K. Saito, M. Yoshino, Y. Yamazaki, T. Namikawa

Research output: Contribution to journal › Article › peer-review

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Abstract

Electroless plated CoB films were plated in a bath with dimethylamineborane (DMAB) as a reducing agent. The magnetic properties of films changed widely with changes in the concentration of the complexing agent in the bath, such as ammonium sulfate or sodium tartrate. Film with the lowest coercivity was obtained from the bath containing 0.3 mol/dm3 of sodium sulfate and 0.55 mol/dm3 of sodium tartrate. Structural analysis of this film by electron microscopy revealed that the film consists of fine, highly crystalline particles with the hcp structure.

Original language	English
Pages (from-to)	85-90
Number of pages	6
Journal	IEEE Translation Journal on Magnetics in Japan
Volume	6
Issue number	1
DOIs	https://doi.org/10.1109/TJMJ.1991.4565111
Publication status	Published - 1991 Jan

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Engineering (miscellaneous)
Engineering(all)

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title = "Preparation of CoB Soft Magnetic Thin Films by Eleetroless Plating",

abstract = "Electroless plated CoB films were plated in a bath with dimethylamineborane (DMAB) as a reducing agent. The magnetic properties of films changed widely with changes in the concentration of the complexing agent in the bath, such as ammonium sulfate or sodium tartrate. Film with the lowest coercivity was obtained from the bath containing 0.3 mol/dm3 of sodium sulfate and 0.55 mol/dm3 of sodium tartrate. Structural analysis of this film by electron microscopy revealed that the film consists of fine, highly crystalline particles with the hcp structure.",

author = "T. Osaka and T. Honma and N. Masubuchi and K. Saito and M. Yoshino and Y. Yamazaki and T. Namikawa",

year = "1991",

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doi = "10.1109/TJMJ.1991.4565111",

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T1 - Preparation of CoB Soft Magnetic Thin Films by Eleetroless Plating

AU - Osaka, T.

AU - Honma, T.

AU - Masubuchi, N.

AU - Saito, K.

AU - Yoshino, M.

AU - Yamazaki, Y.

AU - Namikawa, T.

PY - 1991/1

Y1 - 1991/1

N2 - Electroless plated CoB films were plated in a bath with dimethylamineborane (DMAB) as a reducing agent. The magnetic properties of films changed widely with changes in the concentration of the complexing agent in the bath, such as ammonium sulfate or sodium tartrate. Film with the lowest coercivity was obtained from the bath containing 0.3 mol/dm3 of sodium sulfate and 0.55 mol/dm3 of sodium tartrate. Structural analysis of this film by electron microscopy revealed that the film consists of fine, highly crystalline particles with the hcp structure.

AB - Electroless plated CoB films were plated in a bath with dimethylamineborane (DMAB) as a reducing agent. The magnetic properties of films changed widely with changes in the concentration of the complexing agent in the bath, such as ammonium sulfate or sodium tartrate. Film with the lowest coercivity was obtained from the bath containing 0.3 mol/dm3 of sodium sulfate and 0.55 mol/dm3 of sodium tartrate. Structural analysis of this film by electron microscopy revealed that the film consists of fine, highly crystalline particles with the hcp structure.

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Preparation of CoB Soft Magnetic Thin Films by Eleetroless Plating

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