Preparation of high-Bs Co-Fe soft magnetic thin films by electrodeposition

Tokihiko Yokoshima; Kenta Imai; Toshiki Hiraiwa; Tetsuya Osaka

doi:10.1109/TMAG.2004.832120

Preparation of high-B_s Co-Fe soft magnetic thin films by electrodeposition

Tokihiko Yokoshima^*, Kenta Imai, Toshiki Hiraiwa, Tetsuya Osaka

^*Corresponding author for this work

Research Organization for Nano & Life Innovation

Research output: Contribution to journal › Article › peer-review

15 Citations (Scopus)

Abstract

Co-Fe soft magnetic thin films with high-saturation magnetic flux density B_s were prepared by electrodeposition. The B_s value of the Co-Fe alloy films deposited from the conventional cell system is lower than that of bulk alloys. With the use of a separated compartment dual cell system, the B_s value of the Co-Fe alloy films was reached the same as that of bulk alloy. The coercivity H_c values were higher than 12 Oe; however, the H_c value could be lowered to 8 Oe by annealing in vacuum with an applied magnetic field. It is suggested that decreasing H_c of the films by annealing is caused by relaxation of lattice distortion. In addition, the high-B_s Co-Fe films show good corrosion resistance.

Original language	English
Pages (from-to)	2332-2334
Number of pages	3
Journal	IEEE Transactions on Magnetics
Volume	40
Issue number	4 II
DOIs	https://doi.org/10.1109/TMAG.2004.832120
Publication status	Published - 2004 Jul

Keywords

Co-fe alloy
Head core material
High-saturation magnetic flux density
Soft magnetic material

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

Access to Document

10.1109/TMAG.2004.832120

Cite this

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title = "Preparation of high-Bs Co-Fe soft magnetic thin films by electrodeposition",

abstract = "Co-Fe soft magnetic thin films with high-saturation magnetic flux density Bs were prepared by electrodeposition. The Bs value of the Co-Fe alloy films deposited from the conventional cell system is lower than that of bulk alloys. With the use of a separated compartment dual cell system, the Bs value of the Co-Fe alloy films was reached the same as that of bulk alloy. The coercivity Hc values were higher than 12 Oe; however, the Hc value could be lowered to 8 Oe by annealing in vacuum with an applied magnetic field. It is suggested that decreasing Hc of the films by annealing is caused by relaxation of lattice distortion. In addition, the high-Bs Co-Fe films show good corrosion resistance.",

keywords = "Co-fe alloy, Head core material, High-saturation magnetic flux density, Soft magnetic material",

author = "Tokihiko Yokoshima and Kenta Imai and Toshiki Hiraiwa and Tetsuya Osaka",

note = "Funding Information: Manuscript received October 15, 2003. The work was carried out at the “Center for Practical Nano-Chemistry,” 21C-COE Programme, from the Ministry of Education, Culture, Sports, Science, and Technology, Japan (MEXT). This work was supported in part by a grant-in-aid of Special Coordination Funds for Promoting Science and Technology “Creation of Novel Magnetic Recording Materials Using Nano-Interface Technology,” MEXT, under Project “Establishment of Molecular Nano-Engineering by Utilizing Nanostructure Arrays and its development into Microsystems” of Center Of Excellence (COE), MEXT, and by Grant-in-Aid 14750560 for Scientific Research on Encouragement of Young Scientists (B) from the Japan Society for the Promotion of Science.",

year = "2004",

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doi = "10.1109/TMAG.2004.832120",

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AU - Yokoshima, Tokihiko

AU - Imai, Kenta

AU - Hiraiwa, Toshiki

AU - Osaka, Tetsuya

N1 - Funding Information: Manuscript received October 15, 2003. The work was carried out at the “Center for Practical Nano-Chemistry,” 21C-COE Programme, from the Ministry of Education, Culture, Sports, Science, and Technology, Japan (MEXT). This work was supported in part by a grant-in-aid of Special Coordination Funds for Promoting Science and Technology “Creation of Novel Magnetic Recording Materials Using Nano-Interface Technology,” MEXT, under Project “Establishment of Molecular Nano-Engineering by Utilizing Nanostructure Arrays and its development into Microsystems” of Center Of Excellence (COE), MEXT, and by Grant-in-Aid 14750560 for Scientific Research on Encouragement of Young Scientists (B) from the Japan Society for the Promotion of Science.

PY - 2004/7

Y1 - 2004/7

N2 - Co-Fe soft magnetic thin films with high-saturation magnetic flux density Bs were prepared by electrodeposition. The Bs value of the Co-Fe alloy films deposited from the conventional cell system is lower than that of bulk alloys. With the use of a separated compartment dual cell system, the Bs value of the Co-Fe alloy films was reached the same as that of bulk alloy. The coercivity Hc values were higher than 12 Oe; however, the Hc value could be lowered to 8 Oe by annealing in vacuum with an applied magnetic field. It is suggested that decreasing Hc of the films by annealing is caused by relaxation of lattice distortion. In addition, the high-Bs Co-Fe films show good corrosion resistance.

AB - Co-Fe soft magnetic thin films with high-saturation magnetic flux density Bs were prepared by electrodeposition. The Bs value of the Co-Fe alloy films deposited from the conventional cell system is lower than that of bulk alloys. With the use of a separated compartment dual cell system, the Bs value of the Co-Fe alloy films was reached the same as that of bulk alloy. The coercivity Hc values were higher than 12 Oe; however, the Hc value could be lowered to 8 Oe by annealing in vacuum with an applied magnetic field. It is suggested that decreasing Hc of the films by annealing is caused by relaxation of lattice distortion. In addition, the high-Bs Co-Fe films show good corrosion resistance.

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KW - Soft magnetic material

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