TY - GEN
T1 - PULSE RADIOLYSIS STUDIES ON THE MECHANISM OF THE HIGH SENSITIVITY OF CHLOROMETHYLATED POLYSTYRENE AS AN ELECTRON NEGATIVE RESIST.
AU - Tabata, Y.
AU - Tagawa, S.
AU - Washio, M.
PY - 1984
Y1 - 1984
N2 - Recently, chloromethylated polystyrene (CMS), a highly sensitive, high resolution electron resist with excellent dry etching durability, was developed. Very recently reactive intermediates in irradiated polystyrene, which is a starting material of CMS, have been studied and the transient absorption spectra of excimer, triplet states, charge-transfer complexes, and radical cations of polystyrene have been measured. The present paper describes the cross-linking mechanism of the high sensitivity CMS resist and compares it to that of polystyrene on the basis of data on reactive intermediates of polystyrene and CMS.
AB - Recently, chloromethylated polystyrene (CMS), a highly sensitive, high resolution electron resist with excellent dry etching durability, was developed. Very recently reactive intermediates in irradiated polystyrene, which is a starting material of CMS, have been studied and the transient absorption spectra of excimer, triplet states, charge-transfer complexes, and radical cations of polystyrene have been measured. The present paper describes the cross-linking mechanism of the high sensitivity CMS resist and compares it to that of polystyrene on the basis of data on reactive intermediates of polystyrene and CMS.
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M3 - Conference contribution
AN - SCOPUS:0021550716
SN - 0841208719
T3 - ACS Symposium Series
SP - 151
EP - 163
BT - ACS Symposium Series
A2 - Thompson, L.F.
A2 - Willson, C.G.
A2 - Frechet, J.M.J.
PB - ACS
ER -