Pulse radiolysis study on a highly sensitive chlorinated resist ZEP520A

Yuji Hosaka; Tomoko Gowa Oyama; Akihiro Oshima; Satoshi Enomoto; Masakazu Washio; Seiichi Tagawa

doi:10.2494/photopolymer.26.745

Pulse radiolysis study on a highly sensitive chlorinated resist ZEP520A

Yuji Hosaka, Tomoko Gowa Oyama, Akihiro Oshima, Satoshi Enomoto, Masakazu Washio, Seiichi Tagawa

School of Advanced Science and Engineering

Research output: Contribution to journal › Article › peer-review

12 Citations (Scopus)

Abstract

ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that early reactions in the ZEP520A solid film that were induced only by direct ionization could be simulated during pulse radiolysis in specific solutions.

Original language	English
Pages (from-to)	745-750
Number of pages	6
Journal	Journal of Photopolymer Science and Technology
Volume	26
Issue number	6
DOIs	https://doi.org/10.2494/photopolymer.26.745
Publication status	Published - 2013 Dec 1

Keywords

Direct ionization
Electron beam resist
Pulse radiolysis
ZEP520A

ASJC Scopus subject areas

Polymers and Plastics
Organic Chemistry
Materials Chemistry

Access to Document

10.2494/photopolymer.26.745

Cite this

@article{0f8f4dc533694509a47c962a9e8d2f42,

title = "Pulse radiolysis study on a highly sensitive chlorinated resist ZEP520A",

abstract = "ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that early reactions in the ZEP520A solid film that were induced only by direct ionization could be simulated during pulse radiolysis in specific solutions.",

keywords = "Direct ionization, Electron beam resist, Pulse radiolysis, ZEP520A",

author = "Yuji Hosaka and Oyama, {Tomoko Gowa} and Akihiro Oshima and Satoshi Enomoto and Masakazu Washio and Seiichi Tagawa",

year = "2013",

month = dec,

day = "1",

doi = "10.2494/photopolymer.26.745",

language = "English",

volume = "26",

pages = "745--750",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "6",

}

TY - JOUR

T1 - Pulse radiolysis study on a highly sensitive chlorinated resist ZEP520A

AU - Hosaka, Yuji

AU - Oyama, Tomoko Gowa

AU - Oshima, Akihiro

AU - Enomoto, Satoshi

AU - Washio, Masakazu

AU - Tagawa, Seiichi

PY - 2013/12/1

Y1 - 2013/12/1

N2 - ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that early reactions in the ZEP520A solid film that were induced only by direct ionization could be simulated during pulse radiolysis in specific solutions.

AB - ZEP520A is one of the most popular positive electron beam (EB) resists used in research and photomask fabrication owing to its good spatial resolution, high sensitivity, and high dry etching resistance. Herein, EB-induced early reactions of ZEP520A were investigated via pulse radiolysis. Dissociative electron attachment and formation of a charge transfer complex were definitive contributing factors to the efficient degradation of ZEP520A. Furthermore, products induced by direct ionization of ZEP520A were observed in a highly concentrated ZEP520A solution in tetrahydrofuran, suggesting that early reactions in the ZEP520A solid film that were induced only by direct ionization could be simulated during pulse radiolysis in specific solutions.

KW - Direct ionization

KW - Electron beam resist

KW - Pulse radiolysis

KW - ZEP520A

UR - http://www.scopus.com/inward/record.url?scp=84893453686&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84893453686&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.26.745

DO - 10.2494/photopolymer.26.745

M3 - Article

AN - SCOPUS:84893453686

SN - 0914-9244

VL - 26

SP - 745

EP - 750

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 6

ER -

Pulse radiolysis study on a highly sensitive chlorinated resist ZEP520A

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this