Abstract
Thin films of c-axis-oriented LiCoO2were epitaxially grown by pulsed laser deposition (PLD). The ablation laser conditions greatlyaffect the crystal quality of the epitaxial LiCoO2thin films. In addition, high-quality LiCoO2thin films were found to grow without any impurity phases under relatively low oxygen partial pressure,although high pressure had been often selected to suppress the formation of Co3O4 with a lower valence state as an impurity.This result clearly indicates that the ablation laser conditions are an essential growth parameter, and that composition control is indispensable to grow high-quality complex compound thin films by PLD.
Original language | English |
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Pages (from-to) | 1886-1889 |
Number of pages | 4 |
Journal | Journal of Materials Research |
Volume | 25 |
Issue number | 10 |
DOIs | |
Publication status | Published - 2010 Oct |
Externally published | Yes |
ASJC Scopus subject areas
- Materials Science(all)
- Mechanical Engineering
- Mechanics of Materials
- Condensed Matter Physics