Rare-earth-doped SiO2 films prepared by plasma-enhanced chemical vapour deposition

M. Yoshihara*, A. Sekiya, T. Morita, K. Ishii, S. Shimoto, S. Sakai, Y. Ohki

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

22 Citations (Scopus)


Rare-earth-doped thin SiO2 films were made by plasma-enhanced chemical vapour deposition using a complex containing chelating ligands and tetraethoxysilane. By this means of deposition, the film was successfully doped with terbium or erbium and the luminescence properties were investigated. In the case of Tb3+-doped films, strong luminescence peaks from the 5D4 level were observed during excitation by a KrF excimer laser. Upon thermal treatment at 800 or 900°C, luminescence peaks from the 5D3 level appear. Under DC voltages, electroluminescence from the 5D4 level was also observed.

Original languageEnglish
Pages (from-to)1908-1912
Number of pages5
JournalJournal of Physics D: Applied Physics
Issue number13
Publication statusPublished - 1997 Jul 7

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films


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