Reaction analysis of initial oxidation of silicon by UV-light-excited ozone and the application to rapid and uniform SiO2 film growth

Aki Tosaka*, Hidehiko Nonaka, Shingo Ichimura, Tetsuya Nishiguchi

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

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Physics & Astronomy