TY - JOUR
T1 - Real-time scanning tunneling microscopy observation of Si(111) surface modified by Au+ ion irradiation
AU - Kamioka, Takefumi
AU - Sato, Kou
AU - Kazama, Yutaka
AU - Ohdomari, Iwao
AU - Watanabe, Takanobu
PY - 2010/4/19
Y1 - 2010/4/19
N2 - The real-time scanning tunneling microscopy (STM) observation of Au + ion irradiation effects on a high-temperature Si surface has been performed using our original ion gun and STM combined system. Sequential STM images of a Si(111)-7×7 surface kept at 500 °C have been obtained before, during, and after Au+ ion irradiation with 3 keV. Vacancy islands, which are two-dimensional clusters of surface vacancies, and 5×2-Au structures were formed on the sample surface, and their size were changed during the heat treatment after the ion irradiation. This method enables us to count exact numbers of vacancies and Au atoms on the surface by measuring the sizes of vacancy islands and 5×2-Au reconstructions. The timescale of the growth of the 5×2-Au domain suggests that the implanted Au atoms diffuse to the surface almost without interacting with point defects induced by the ion irradiation.
AB - The real-time scanning tunneling microscopy (STM) observation of Au + ion irradiation effects on a high-temperature Si surface has been performed using our original ion gun and STM combined system. Sequential STM images of a Si(111)-7×7 surface kept at 500 °C have been obtained before, during, and after Au+ ion irradiation with 3 keV. Vacancy islands, which are two-dimensional clusters of surface vacancies, and 5×2-Au structures were formed on the sample surface, and their size were changed during the heat treatment after the ion irradiation. This method enables us to count exact numbers of vacancies and Au atoms on the surface by measuring the sizes of vacancy islands and 5×2-Au reconstructions. The timescale of the growth of the 5×2-Au domain suggests that the implanted Au atoms diffuse to the surface almost without interacting with point defects induced by the ion irradiation.
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U2 - 10.1143/JJAP.49.015702
DO - 10.1143/JJAP.49.015702
M3 - Article
AN - SCOPUS:77950815037
SN - 0021-4922
VL - 49
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 1 Part 1
M1 - 015702
ER -