Redox Reactions at Cu,Ag/Ta₂O₅ Interfaces and the Effects of Ta₂O₅ Film Density on the Forming Process in Atomic Switch Structures

Tohru Tsuruoka^*, Ilia Valov, Stefan Tappertzhofen, Jan Van Den Hurk, Tsuyoshi Hasegawa, Rainer Waser, Masakazu Aono

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review