Research and Development of High Performance Soft Magnetic Thin Films

Tetsuya Osaka; Toshiyuki Momma; Tokihiko Yokoshima

doi:10.5796/electrochemistry.67.894

Research and Development of High Performance Soft Magnetic Thin Films

Tetsuya Osaka, Toshiyuki Momma, Tokihiko Yokoshima

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (B_s) and low coercivity. Magnetic properties except for B_s and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high B_s CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.

Original language	English
Pages (from-to)	894-899
Number of pages	6
Journal	Electrochemistry
Volume	67
Issue number	9
DOIs	https://doi.org/10.5796/electrochemistry.67.894
Publication status	Published - 1999 Sept
Externally published	Yes

Keywords

Electrodeposition
High B Film
High ρ Film
Soft Magnetic Film

ASJC Scopus subject areas

Electrochemistry

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10.5796/electrochemistry.67.894

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title = "Research and Development of High Performance Soft Magnetic Thin Films",

abstract = "Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (Bs) and low coercivity. Magnetic properties except for Bs and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high Bs CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.",

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author = "Tetsuya Osaka and Toshiyuki Momma and Tokihiko Yokoshima",

year = "1999",

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doi = "10.5796/electrochemistry.67.894",

language = "English",

volume = "67",

pages = "894--899",

journal = "Electrochemistry",

issn = "1344-3542",

publisher = "Electrochemical Society of Japan",

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T1 - Research and Development of High Performance Soft Magnetic Thin Films

AU - Osaka, Tetsuya

AU - Momma, Toshiyuki

AU - Yokoshima, Tokihiko

PY - 1999/9

Y1 - 1999/9

N2 - Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (Bs) and low coercivity. Magnetic properties except for Bs and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high Bs CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.

AB - Soft magnetic films for head core materials mainly electrodeposited CoNiFe based films developed by us were introduced. Electrodeposited CoNiFe thin film has high saturation magnetic flux density (Bs) and low coercivity. Magnetic properties except for Bs and corrosion properties of these films were depended on very small amount of inclusion such as S and H elements. The increase in resistivity (ρ) on the base of this high Bs CoNiFe thin film was developed by controlling very small amount of C inclusion. Finally, application of the film to new type of magnetic recording head was reported.

KW - Electrodeposition

KW - High B Film

KW - High ρ Film

KW - Soft Magnetic Film

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JO - Electrochemistry

JF - Electrochemistry

IS - 9

ER -

Research and Development of High Performance Soft Magnetic Thin Films

Abstract

Keywords

ASJC Scopus subject areas

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