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Robustness of CNT via interconnect fabricated by low temperature process over a high-density current
Akio Kawabata*, Shintaro Sato, Tatsuhiro Nozue, Takashi Hyakushima, Masaaki Norimatsu, Miho Mishima, Tomo Murakami, Daiyu Kondo, Koji Asano, Mari Ohfuti, Hiroshi Kawarada, Tadashi Sakai, Mizuhisa Nihei, Yuji Awano
*Corresponding author for this work
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
47
Citations
(Scopus)