TY - JOUR
T1 - ScAlN Thick-Film Ultrasonic Transducer in 40-80 MHz
AU - Sano, Ko Hei
AU - Karasawa, Rei
AU - Yanagitani, Takahiko
N1 - Funding Information:
Manuscript received January 26, 2018; accepted July 9, 2018. Date of publication August 24, 2018; date of current version November 7, 2018. This work was supported in part by the Japan Science and Technology Agency, PRESTO under Grant JPMJPR16R8 and in part by JSPS KAKENHI under Grant 16H04356 and Grant 18K19037. (Corresponding author: Takahiko Yanagitani.) K.-h. Sano and R. Karasawa are with the Graduate School of Advanced Science and Engineering, Waseda University, Tokyo 169-8555, Japan.
Publisher Copyright:
© 1986-2012 IEEE.
PY - 2018/11
Y1 - 2018/11
N2 - A medical ultrasound diagnostic system and an ultrasonic microscope are generally used in the frequency range of 1-20 MHz and 100 MHz-2 GHz, respectively. Ultrasonic transducers in the frequency range of 20-100 MHz are, therefore, not well developed because of less application into ultrasonic imaging or suitable piezoelectric materials with this frequency range. Polyvinylidene difluoride (PVDF) is usually used for ultrasonic transducers in the 10-50-MHz ranges. However, their electromechanical coupling coefficient k t 2 of 4% is not enough for the practical uses. In order to excite the ultrasonic wave in the 20-100 MHz range, a 125-25-μ m-thick piezoelectric film is required when the longitudinal velocity of the material is assumed to be 5000 m/s. However, it is difficult to grow such a thick piezoelectric film without a crack being caused by the internal stress during the dry deposition technique. We achieved a stress-free film growth by employing the unique hot target sputtering technique without heating the substrate. High-efficient 81- (k t 2 = 18.5%) and 43-MHz ( k t 2 = 15.2%) ultrasonic generation by using the 43- and 90-μm extremely thick ScAlN (Sc: 39%) films were demonstrated, respectively. We discussed the advantage of ScAlN thick-film transducers by comparing them with the conventional PVDF transducer for the water medium.
AB - A medical ultrasound diagnostic system and an ultrasonic microscope are generally used in the frequency range of 1-20 MHz and 100 MHz-2 GHz, respectively. Ultrasonic transducers in the frequency range of 20-100 MHz are, therefore, not well developed because of less application into ultrasonic imaging or suitable piezoelectric materials with this frequency range. Polyvinylidene difluoride (PVDF) is usually used for ultrasonic transducers in the 10-50-MHz ranges. However, their electromechanical coupling coefficient k t 2 of 4% is not enough for the practical uses. In order to excite the ultrasonic wave in the 20-100 MHz range, a 125-25-μ m-thick piezoelectric film is required when the longitudinal velocity of the material is assumed to be 5000 m/s. However, it is difficult to grow such a thick piezoelectric film without a crack being caused by the internal stress during the dry deposition technique. We achieved a stress-free film growth by employing the unique hot target sputtering technique without heating the substrate. High-efficient 81- (k t 2 = 18.5%) and 43-MHz ( k t 2 = 15.2%) ultrasonic generation by using the 43- and 90-μm extremely thick ScAlN (Sc: 39%) films were demonstrated, respectively. We discussed the advantage of ScAlN thick-film transducers by comparing them with the conventional PVDF transducer for the water medium.
KW - Piezoelectric films
KW - ScAlN
KW - piezoelectric resonators
KW - sputtering
KW - thick piezoelectric film
KW - ultrasonic transducer
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U2 - 10.1109/TUFFC.2018.2865791
DO - 10.1109/TUFFC.2018.2865791
M3 - Article
C2 - 30418872
AN - SCOPUS:85052717887
SN - 0885-3010
VL - 65
SP - 2097
EP - 2102
JO - IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
JF - IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control
IS - 11
M1 - 8445654
ER -