Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

Shingo Kataza; Kentaro Ishibashi; Mitsunori Kokubo; Hiroshi Goto; Jun Mizuno; Shuichi Shoji

doi:10.1143/JJAP.48.06FH21

Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

Shingo Kataza, Kentaro Ishibashi^*, Mitsunori Kokubo, Hiroshi Goto, Jun Mizuno, Shuichi Shoji

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

7 Citations (Scopus)

Abstract

The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm² pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

Original language	English
Pages (from-to)	06FH211-06FH213
Journal	Japanese journal of applied physics
Volume	48
Issue number	6 PART 2
DOIs	https://doi.org/10.1143/JJAP.48.06FH21
Publication status	Published - 2009 Jun 1

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

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@article{a6d168684e4d4098945c0e4e007511de,

title = "Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography",

abstract = "The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.",

author = "Shingo Kataza and Kentaro Ishibashi and Mitsunori Kokubo and Hiroshi Goto and Jun Mizuno and Shuichi Shoji",

year = "2009",

month = jun,

day = "1",

doi = "10.1143/JJAP.48.06FH21",

language = "English",

volume = "48",

pages = "06FH211--06FH213",

journal = "Japanese journal of applied physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "6 PART 2",

}

TY - JOUR

T1 - Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

AU - Kataza, Shingo

AU - Ishibashi, Kentaro

AU - Kokubo, Mitsunori

AU - Goto, Hiroshi

AU - Mizuno, Jun

AU - Shoji, Shuichi

PY - 2009/6/1

Y1 - 2009/6/1

N2 - The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

AB - The seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography (UV-NIL) was studied. Large-area nanopatterning is required in the actual mass production of optical devices and biological microchips. We applied the double lithography method of litho-etch-litho-etch for UV-NIL process. The proposed multiple UV-NIL process realized 66 × 45 mm2 pattern area, which has 50 nm width and 150 nm space line patterns on a quartz wafer.

UR - http://www.scopus.com/inward/record.url?scp=70249140590&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=70249140590&partnerID=8YFLogxK

U2 - 10.1143/JJAP.48.06FH21

DO - 10.1143/JJAP.48.06FH21

M3 - Article

AN - SCOPUS:70249140590

SN - 0021-4922

VL - 48

SP - 06FH211-06FH213

JO - Japanese journal of applied physics

JF - Japanese journal of applied physics

IS - 6 PART 2

ER -

Seamless pattern fabrication of large-area nanostructures using ultraviolet nanoimprint lithography

Abstract

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